632.8 nm 高精度移相菲佐干涉仪测量误差分析

为了满足高精度光学系统对光学元件纳米级的检测精度要求,提出了一种理论可实现纳米级测量的632.8 nm移相菲佐干涉仪的设计方案。通过对检测凹面和凸面的632.8 nm 移相菲佐干涉仪的基本结构和测量原理的分析,指出影响干涉仪测量精度的几种主要误差：移相误差、几何结构误差、振动误差、探测器误差(非线性误差和量化误差)、光源误差(波长不稳定和强度不稳定)、空气扰动和折射率变化误差。通过对这些误差理论分析和模拟,量化了各误差对测量精度的影响,其中移相误差、几何误差、振动误差和空气折射率误差影响最为显著。根据测量精度要求和仿真结果,得到实现纳米级测量的干涉仪系统参数和环境参数设置要求。

Abstract

To satisfy the need of nanometer measurement for high accuracy optical system,the design of nanometer measurement 632.8 nm phase-shifting Fizeau interferometer is presented. The elementary configuration and measuring principle of the 632.8 nm phase-shifting Fizeau interferometer to measure concave and convex surface are introduced. Some errors that affect the accuracy of interferometer are pointed out,including phase-shifting error,geometrical configuration induced error,vibration error and errors caused by CCD,laser source and fluctuating surroundings. The magnitude of measurement errors is obtained through analysis and simulation,among which phase-shifting error,geometrical configuration induced error,vibration error and fluctuating surroundings have great influence. Finally a group of system parameters and environment paraments for 632.8 nm phase-shifting Fizeau interferometer to realize nanometer measurement are given in theory.

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魏豪明, 邢廷文, 李云, 刘志祥. 632.8 nm 高精度移相菲佐干涉仪测量误差分析[J]. 激光与光电子学进展, 2010, 47(4): 041202. Wei Haoming, Xing Tingwen, Li Yun, Liu Zhixiang. Measurement Errors in 632.8 nm High Precision Phase-Shifting Fizeau Interferometer[J]. Laser & Optoelectronics Progress, 2010, 47(4): 041202.

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