不同基底材料对极紫外收集镜聚焦性能的影响 下载: 963次
谢婉露, 吴晓斌, 王魁波, 罗艳, 王宇. 不同基底材料对极紫外收集镜聚焦性能的影响[J]. 激光与光电子学进展, 2020, 57(17): 173401.
Wanlu Xie, Xiaobin Wu, Kuibo Wang, Yan Luo, Yu Wang. Effect of Different Substrate Materials on Focusing Beam Performance of EUV Collector[J]. Laser & Optoelectronics Progress, 2020, 57(17): 173401.
[1] Pirati A, van Schoot J, Troost K, et al. The future of EUV lithography: enabling Moore's Law in the next decade[J]. Proceedings of SPIE, 2017, 1014: 101430G.
[2] Obert R W. EUVL: challenges to manufacturing insertion[J]. Journal of Photopolymer Science & Technology, 2017, 30(5): 599-604.
[3] Levinson H J, Brunner T A. Current challenges and opportunities for EUV lithography[J]. Proceedings of SPIE, 2018, 1080: 1080903.
[4] 李艳秋, 刘岩, 刘丽辉. 16 nm极紫外光刻物镜热变形对成像性能影响的研究[J]. 光学学报, 2019, 39(1): 0122001.
[5] 喻波, 李春, 金春水, 等. 极紫外光刻照明系统宽带Mo/Si多层膜设计与制备[J]. 中国激光, 2016, 43(4): 0407001.
[6] 刘晓雷, 李思坤, 王向朝. 基于等效膜层法的极紫外光刻含缺陷掩模多层膜仿真模型[J]. 光学学报, 2015, 36(6): 0622005.
Liu X L, Li S K, Wang X Z. Simulation model based on equivalent layer method for defective mask multilayer in extremeultra violet lithography[J]. Acta Optica Sinica, 2015, 36(6): 0622005.
[7] 陈进新, 王宇, 谢婉露. 极紫外光刻动态气体锁抑制率的实验研究[J]. 光学学报, 2017, 37(2): 0222002.
[8] Braun S. Foltyn T, van Loyen L, et al. Multi component EUV multilayer mirrors[J]. Proceedings of SPIE, 2003, 5037: 274-285.
[9] Schroder S, Feigl T, Duparré A, et al. EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates[J]. Optics Express, 2007, 15(21): 13997-14012.
[10] Feigl T, Yulin S, Benoit N, et al. High-temperature LPP collector mirror[J]. Proceedings of SPIE, 2006, 6151: 61514A.
[11] Robichaud J L. SiC optics for EUV, UV, and visible space missions[J]. Proceedings of SPIE, 2003, 4854: 39-49.
[12] Ershov A I, Marx W F, et al. EUV source collector[J]. Proceedings of SPIE, 2006, 6151: 61513R.
[13] ClaudiaE, JohannesL, HolgerM, et al. 2013-07-04.
[14] StefanR, AndreasG, ThomasP, et al., metalmirror, method for the production thereof, use thereof:US20130057952[P]. 2013-03-07.
[15] Gebhardt A, Risse S, Peschel T, et al. New nickel plated metal mirrors utilizing meltspun aluminium silicon alloy[J]. Proceedings of the Euspen International Conference, 2009.
[16] Rohloff R R, Gebhardt A, Schonherr V, et al. A novel athermal approach for high-performance cryogenic metal optics[J]. Proceedings of SPIE, 2010, 7739: 139-144.
谢婉露, 吴晓斌, 王魁波, 罗艳, 王宇. 不同基底材料对极紫外收集镜聚焦性能的影响[J]. 激光与光电子学进展, 2020, 57(17): 173401. Wanlu Xie, Xiaobin Wu, Kuibo Wang, Yan Luo, Yu Wang. Effect of Different Substrate Materials on Focusing Beam Performance of EUV Collector[J]. Laser & Optoelectronics Progress, 2020, 57(17): 173401.