研究了一种LaB6与TaC混合涂层热阴极，其发射层通过均匀混合LaB6与TaC粉末得到。比较了该阴极在LaB6与TaC混合比例为1∶1, 2∶1和3∶1下的发射特性，发现混合型LaB6阴极的功函数与多晶LaB6阴极的非常接近，在3∶1的混合比例下，电极的发射电流稳定，得到的电流密度为30 A/cm2。该电极可被应用于需要大电流密度和超大面积阴极的真空电子器件及动态真空电子束设备中。

We report a new structure for broadband antireflection coating by dip-coating technique, which has minimal cost and is compatible with large-scale manufacturing. The coatings are prepared by depositing SiO2 sol-gel film on a glass substrate, subsequently depositing SiO2 single-layer particle coating through electrostatic attraction, and depositing a final very thin SiO2 sol-gel film to improve the mechanical strength of the whole coating structure. The refractive index of the structure changes gradually from the top to the substrate. The transmittance of a glass substrate has been experimentally found to be improved in the spectral range of 400-1,400 nm and in the incidence angle range from 0o to at least 45o. The mechanical strength is immensely improved because of the additional thin SiO2 sol-gel layer. The surface texture can be applied to the substrates of different materials and shapes as an add-on coating.

A dispersive white-light spectral interferometer for precise measurements of the phase properties of multilayer thin film structures is built. A novel wavelet-based differentiation approach that considerably resists measurement error of group delay (GD) and group delay dispersion (GDD) is introduced. Versatile applications beyond phase measurement of the apparatus are demonstrated, including piezoelectric coefficient determination and physical thickness retrieval. With the increase of demand for thin film structures with specific phase properties, this white-light spectral interferometer can play an important role in future thin film industry.

A new organic-inorganic hybrid material, which shows photo-induced reduction of refractive index as well as volume contraction, is prepared using a sol-gel method. This material is coated on a Si substrate by spin-coating to manufacture film. After irradiated by ultraviolet (UV) light with a deuterium lamp for 5 h, the thickness of film decreases largely by 55%, and the refractive index of film changes from 1.484 to 1.445 at 550 nm. The film’s optical thickness exhibits an exponential change with the increasing irradiation time. Futhermore, the photo-patternning of the organic-inorganic hybrid film without any further process (wet etching and thermal curing) is performed utilizing the volume contraction on UV-light irradiation. This film has potential applications for fabrication of patterned filter array and apodizing filter by direct light writing, and also demonstrates good temperature stability and immunity to visible light exposure.