Author Affiliations
Abstract
1 Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
2 Beijing Superstring Academy of Memory Technology, Beijing 100176, China
3 Research and Development Center of Optoelectronic Hybrid IC, Guangdong Greater Bay Area Institute of Integrated Circuit and System, Guangzhou 510535, China
4 Microelectronics Institute, University of Chinese Academy of Sciences, Beijing 100049, China
5 Hefei National Laboratory, Hefei 230088, China
Fifteen periods of Si/Si0.7Ge0.3 multilayers (MLs) with various SiGe thicknesses are grown on a 200 mm Si substrate using reduced pressure chemical vapor deposition (RPCVD). Several methods were utilized to characterize and analyze the ML structures. The high resolution transmission electron microscopy (HRTEM) results show that the ML structure with 20 nm Si0.7Ge0.3 features the best crystal quality and no defects are observed. Stacked Si0.7Ge0.3 ML structures etched by three different methods were carried out and compared, and the results show that they have different selectivities and morphologies. In this work, the fabrication process influences on Si/SiGe MLs are studied and there are no significant effects on the Si layers, which are the channels in lateral gate all around field effect transistor (L-GAAFET) devices. For vertically-stacked dynamic random access memory (VS-DRAM), it is necessary to consider the dislocation caused by strain accumulation and stress release after the number of stacked layers exceeds the critical thickness. These results pave the way for the manufacture of high-performance multivertical-stacked Si nanowires, nanosheet L-GAAFETs, and DRAM devices.
RPCVD epitaxy SiGe/Si multilayers L-GAAFETs VS-DRAM 
Journal of Semiconductors
2023, 44(12): 124101
Author Affiliations
Abstract
1 Physics Department, collage of Science, Juof University, PO Box 2014, Sakaka, Saudi Arabia
2 Physics Department, Faculty of Science, Sohag University, Sohag 82524, Egypt
3 Physics Department, Faculty of Science and Arts, Al-Mandaq, Al-Baha University, 65755, Saudi Arabia
In this study, CdO/Cu/CdO multilayers thin films were organized on glass substrates with different Cu intermetallic layer thickness engaging DC plasma magnetron sputtering. The optoelectronic properties and structural characteristics of the multilayers at various Cu intermetallic layer thicknesses which were varied from 4 to 16 nm were explored. The calculated band gap was reduced from 2.66 eV to 2.48 eV as the Cu intermetallic layer thickness increased from 4 to 16 nm. The refractive index and coefficient of extinction of CdO/Cu/CdO multilayers increased with increasing the Cu intermetallic layer thickness. The resistivity is reduced from 1.8 × 10−2 Ω cm for CdO single layer to reach a value of 2.7 × 10−4 Ω cm for CdO/Cu (16 nm)/CdO multilayer. Further, the sheet resistance is decreased from 1000 to 13.8 Ω/sq. with the variation in Cu intermetallic layer thickness from 0 to 16 nm. CdO/Cu (4 nm)/CdO multilayer film recorded the best figure of merit (2.3 × 10−4 Ω−1). After sunlight illumination for the multilayers, the surface wettability was improved and the contact angle recorded lowest value of nearly 24° for CdO/Cu (8 nm)/CdO and CdO/Cu (12 nm)/CdO.
Optical properties CdO/Cu/CdO multilayers Surface wettability 
Journal of the European Optical Society-Rapid Publications
2023, 19(1): 2023009
张云学 1黄秋实 1,*朱一帆 1张哲 1[ ... ]王占山 1,**
作者单位
摘要
1 同济大学物理科学与工程学院先进微结构材料教育部重点实验室,精密光学工程技术研究所,上海 200092
2 中国科学院上海高等研究院,上海 201204
为满足同步辐射装置中X射线单色器的需求,在直线式磁控溅射设备上制备了W/Si和Ru/C双通道多层膜反射镜。制备的W/Si多层膜和Ru/C多层膜的周期厚度均为3 nm,平均界面宽度分别为0.30 nm和0.32 nm。在320 mm长度范围和20 mm宽度范围内,W/Si多层膜膜厚误差的均方根值分别为0.30%和0.19%,Ru/C多层膜膜厚误差的均方根值分别为0.39%和0.20%。对制备的样品进行了表面形貌测试和非镜面散射测试,对比了W/Si多层膜和Ru/C多层膜的表面和界面粗糙度大小。硬X射线反射率测试结果表明,W/Si多层膜和Ru/C多层膜在8.04 keV能量点处的一级布拉格峰测试反射率分别为63%和62%,角分辨率均为2.6%。基于以上研究,在尺寸为350 mm×60 mm的高精度Si平面镜表面镀制了W/Si和Ru/C双通道多层膜,并且其被成功应用于上海同步辐射光源线站中。
X射线光学 双通道多层膜 磁控溅射 均匀性 反射率 
光学学报
2023, 43(2): 0234001
作者单位
摘要
同济大学 物理科学与工程学院,先进微结构材料教育部重点实验室,精密光学工程技术研究所,上海200092
X射线多层膜是同步辐射与自由电子激光、天文观测、等离子体诊断等大科学装置和实验室分析仪器的重要光学元件,能高效率反射X射线并实现单色和偏振化等调控。本课题组在近二十年的工作中对X射线多层膜的设计、制备和表征方法开展了系统深入的研究,研制了一系列工作在软X射线和硬X射线不同波段的高性能多层膜,反射率达到国际先进水平;基于磁控溅射技术建立了大尺寸掠入射X射线多层膜的镀制平台,最大镀膜尺寸达1.2 m,均匀性优于0.5%(均方根值),制备的硬X射线多层膜反射镜成功应用在国内外大科学装置中;通过将多层膜与反射光栅相结合,创新发展了超高效率韧X射线多层膜光栅元件,相比传统单层膜光栅,该元件能将韧X射线衍射效率最高提升40倍。本文将简要介绍课题组在X射线多层膜元件领域的研究进展。
X射线多层膜 反射率 大尺寸反射元件 多层光栅 X-ray multilayers reflectivity large size reflective optics multilayer gratings 
光学 精密工程
2022, 30(21): 2793
肖两省 1齐润泽 2,3,*来搏 2,3黄秋实 2,3[ ... ]辛子华 1,*
作者单位
摘要
1 上海大学 物理系,上海 200444
2 同济大学 物理科学与工程学院 精密光学工程技术研究所,上海 200092
3 先进微结构材料教育部重点实验室,上海 200092
为研究本底真空对Yb/Al多层膜微结构和光学性能的影响,使用直流磁控溅射设备,在本底真空度分别为4×10-5 Pa、8×10-5 Pa、1×10-4 Pa、2×10-4 Pa和4×10-4 Pa条件下,制备了一组结构相同的SiC/(Yb/Al)3周期多层膜。使用X射线掠入射反射、原子力显微镜及大角X射线衍射等方法表征了样品表面和内部结构,结果表明:当本底真空度从4×10-4 Pa提高至4×10-5 Pa时,Yb/Al多层膜的平均界面宽度从2.15 nm减小到1.82 nm;表面粗糙度从1.87 nm减小到1.43 nm;膜层内有Yb、Yb2O3和Al结晶,结晶尺寸随真空度略有增加。SiC/(Yb/Al)3周期多层膜为张应力,当本底真空度从4×10-4 Pa提升至4×10-5 Pa时,应力从85 MPa增大到142 MPa。测试了本底真空度为4×10-5 Pa时制备的多层膜样品的反射率,在波长为73.6 nm、入射角为5°时,反射率为31.3%。
紫外辐射 真空沉积 多层膜 反射 磁控溅射 Ultraviolet radiation Vacuum deposition Multilayers Reflection Magnetron sputtering 
光子学报
2021, 50(11): 1131001
Author Affiliations
Abstract
1 Research & Innovation, Technicolor R&D France, 975 avenue des Champs Blancs, 35576 Cesson-Sévigné, France
2 CCQCN, Department of Physics, University of Crete, P.O. Box 2208, 71003 Heraklion, Greece
3 College of Optics & Photonics-CREOL, University of Central Florida, Orlando, Florida 32816, USA
4 Institute of Electronic Structure and Laser, Foundation for Research and Technology–Hellas, P.O. Box 1527, 71110 Heraklion, Greece
5 National University of Science and Technology MISiS, Leninsky prosp. 4, Moscow 119049, Russia
The effect of material dispersion on the optical properties of one-dimensional non-Hermitian scattering systems is investigated in detail. In particular, multilayer heterostructures with gain and loss (parity-time symmetric or not) are examined by taking into account the dispersion of each layer. The exceptional points and phase transitions are characterized based on the spectrum of the corresponding scattering matrix. We demonstrate that an on-average lossy heterostructure can amplify an incident plane wave in the frequency range associated with the emission frequency of the layer with gain.
Multilayers Photonic crystals 
Photonics Research
2018, 6(4): 040000A1
Author Affiliations
Abstract
1 Institute of Electromagnetics and Acoustics, and Department of Electronic Science, Xiamen University, Xiamen 361005, China
2 Department of Electrical and Computer Engineering, Duke University, Durham, North Carolina 27708, USA
Multiple resonant excitations of surface plasmons in a graphene stratified slab are realized by Otto configuration at terahertz frequencies. The proposed graphene stratified slab consists of alternating dielectric layers and graphene sheets, and is sandwiched between a prism and another semi-infinite medium. Optical response and field distribution are determined by the transfer matrix method with the surface current density boundary condition. Multiple resonant excitations appear on the angular reflection spectrum, and are analyzed theoretically via the phase-matching condition. Furthermore, the effects of the system parameters are investigated. Among them, the Fermi levels can tune the corresponding resonances independently. The proposed concept can be engineered for promising applications, including angular selective or multiplex filters, multiple channel sensors, and directional delivery of energy.
Surface plasmons Multilayers Prisms Filters, absorption Multiplexing 
Photonics Research
2017, 5(4): 04000377
作者单位
摘要
同济大学 物理科学与工程学院 先进微结构材料教育部重点实验室,上海 200092
NiC/Ti中子超镜是一种高性能的中子多层膜光学元件,是提升中子导管、聚焦装置等中子光学系统的中子利用率的关键之一。为了提升NiC/Ti中子超镜的性能,本文面向具有不同厚度NiC膜层的NiC/Ti多层膜,分别采用X射线掠入射反射和X射线衍射的方法表征了NiC/Ti多层膜的膜层厚度、界面粗糙度和膜层晶向结构。研究结果表明: 随着NiC膜层厚度的增长,除了在较小尺度(≤2.5 nm),NiC-on-Ti界面的粗糙度基本保持不变; 而Ti-on-NiC界面的粗糙度却呈现出较大的变化。具有不同厚度的NiC膜层的NiC/Ti多层膜的界面粗糙度呈现不对称性的变化,主要原因在于NiC膜层的微结构随着膜层厚度的增长而产生了变化。
磁控溅射 NiC/Ti多层膜 微结构 界面粗糙度 magnetron sputtering NiC/Ti multilayers microstructure interface roughness 
光学 精密工程
2017, 25(11): 2859
作者单位
摘要
中国科学院 长春光学精密机械与物理研究所 应用光学国家重点实验室,吉林 长春 130033
针对极紫外(EUV)光刻机工作过程中,多层膜反射镜表面沉积碳污染造成的反射率下降问题展开研究,讨论了多层膜反射镜表面碳污染清洗方法。首先描述了在EUV曝光过程中多层膜表面的碳污染形成过程,简单阐述了碳污染对多层膜反射镜的危害。然后从清洗机理、速率以及效果等方面详细描述了多种EUV多层膜表面碳污染清洗方法,分析对比了各清洗技术在清洗速率和效果等方面的优缺点。分析表明: 离子体氧和活化氧清洗速率相差不多,可达到2 nm/min,但清洗过程中容易造成表面氧化; 等离子体氢和原子氢的清洗速率相对较慢,一般在0.37 nm/min左右,但清洗过程中不易产生氧化。最后针对不同方法应用于在线清洗EUV多层膜反射镜过程中将遇到的问题和难点进行了讨论。
极紫外光刻机 碳污染 清洗 技术 多层膜反射镜 extreme ultraviolet lithography carbon contamination cleaning technologies multilayers 
光学 精密工程
2017, 25(11): 2835
作者单位
摘要
武汉军械士官学校 光电技术研究所, 湖北 武汉 430075
为解决类金刚石膜内应力极大的问题, 利用很薄的岛状结构锗层与较厚的类金刚石层循环, 设计并制备了具有低内应力的多层类金刚石膜。其中, 类金刚石层为主要功能膜层, 起到硬质保护和光学增透的作用; 而锗层作为缓冲层, 起到缓解纯类金刚石膜内应力过大的问题, 同时由于锗层很薄, 对整个膜层的机械性能和红外特性的影响很小。测试表明, 制备的多层类金刚石膜内应力为2.14 GPa, 比纯类金刚石膜降低了39%, 通过了GJB2485-95《光学膜层通用规范》中的重摩擦测试; 同时, 其纳米硬度仍保持在47 GPa的高水平。该多层类金刚石膜可以作为实际应用的红外窗口保护膜。
脉冲激光沉积 多层类金刚石膜 锗缓冲层 低内应力 pulsed laser deposition multilayers diamond-like carbon film germanium buffer layers low inner-stress 
红外与激光工程
2017, 46(9): 0921001

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