Author Affiliations
Abstract
1 MISiS University, Moscow 119049, Russia
2 Perfect Crystala LLC, St. Petersburg 194223, Russia
3 Tomsk State University, Tomsk 634050, Russia
A commercial epi-ready (2¯01) β-Ga2O3 wafer was investigated upon diamond sawing into pieces measuring 2.5 × 3 mm2. The defect structure and crystallinity in the cut samples has been studied by X-ray diffraction and a selective wet etching technique. The density of defects was estimated from the average value of etch pits calculated, including near-edge regions, and was obtained close to 109 cm−2. Blocks with lattice orientation deviated by angles of 1−3 arcmin, as well as non-stoichiometric fractions with a relative strain about (1.0−1.5) × 10−4 in the [2¯01] direction, were found. Crystal perfection was shown to decrease significantly towards the cutting lines of the samples. To reduce the number of structural defects and increase the crystal perfection of the samples via increasing defect motion mobility, the thermal annealing was employed. Polygonization and formation of a mosaic structure coupled with dislocation wall appearance upon 3 h of annealing at 1100 °C was observed. The fractions characterized by non-stoichiometry phases and the block deviation disappeared. The annealing for 11 h improved the homogeneity and perfection in the crystals. The average density of the etch pits dropped down significantly to 8 × 106 cm−2.
gallium oxide epi-ready substrate etch pits crystal defect mosaic structure crystal perfection 
Journal of Semiconductors
2023, 44(12): 122801
高崇 1,2,*韦金汕 3,4欧阳政 1,2何敬晖 1,2[ ... ]赵鹏 1,2
作者单位
摘要
1 北京中材人工晶体研究院有限公司,北京100018
2 中材人工晶体研究院有限公司,北京100018
3 华南师范大学半导体科学与技术学院,广州510631
4 杭州光学精密机械研究所,杭州311421
5 中材高新材料股份有限公司,北京100102
6 中国科学院上海光学精密机械研究所,上海201800
7 中国科学院大学材料科学与光电技术学院,北京100049
氧化镓晶体材料由于其优异的性能以及可以用熔体法生长的优势,在功率器件、光电领域有着巨大的潜力。近年来,国内外众多专家也随之开展对氧化镓单晶材料的研究工作,高质量低缺陷的氧化镓单晶材料对后续的外延、器件的制备极其重要。目前,国际上主流的生长方法是导模法,导模法具有生长周期短、尺寸大及生长稳定等优点,然而在晶体缺陷控制方面还有很大的进步空间。本文围绕氧化镓单晶的腐蚀坑形貌,对导模法生长的氧化镓单晶进行加工制样,进行了不同酸碱条件下的腐蚀实验。详细介绍了观察到的不同腐蚀坑形貌,分析了晶体缺陷对腐蚀坑形貌的影响,对今后氧化镓单晶生长机理和晶体缺陷的研究具有重要意义。
氧化镓单晶 导模法 缺陷 腐蚀 腐蚀坑形貌 单晶生长 gallium oxide single crystal edgedefined filmfed growth method defect corrosion corrosion pit morphology crystal growth 
人工晶体学报
2023, 52(12): 2186
作者单位
摘要
1 广东工业大学材料与能源学院,广东 广州 510006
2 广东工业大学集成电路学院,广东 广州 510006
通过溶液法在石英玻璃衬底上制备氧化镓(Ga2O3)薄膜,研究氮气、空气和氧气气氛退火的Ga2O3薄膜的结构、光学特性、缺陷能级与电学特性。结果表明,氮气气氛退火的Ga2O3薄膜的形貌组织最致密均匀且最厚,氧气气氛退火的薄膜结晶度最优。所有样品在可见光区的平均透光率均高于80%,且在260 nm附近都出现陡峭的吸收边,在190 nm处透光率均低于10%,氮气、空气和氧气气氛退火的Ga2O3薄膜的禁带宽度分别为5.10 eV、5.07 eV和5.18 eV。氮气、空气、氧气气氛退火的样品在蓝-紫外波段的光致发光强度依次降低。根据光致发光谱分析Ga2O3薄膜缺陷能级,Ga2O3的施主能级到导带的距离随着禁带宽度值的增大而增大。氮气、空气、氧气气氛退火的样品电阻依次增大。本文实验中最优退火气氛为氮气。
薄膜 氧化镓薄膜 退火气氛 溶液法 缺陷能级 薄膜特性 
光学学报
2023, 43(23): 2331002
作者单位
摘要
南京邮电大学集成电路科学与工程学院,江苏 南京 210023
氧化镓(Ga2O3)因其合适的禁带宽度(4.5~5.3 eV)在深紫外探测方面具有天然的优势。本文利用常温磁控溅射技术在非晶Ga2O3薄膜表面溅射银纳米颗粒,制备出简易的深紫外光电探测器。结果表明,在5 V偏压下,探测器的暗电流低至94 fA,光暗电流比高达5.9×105,254 nm/365 nm波长抑制比达到1.6×104,探测率为2×1014 Jones(探测率单位),且该探测器在不同电压和不同光强下都能快速且稳定地响应。该探测器优异的深紫外光探测表现与引入的金属银纳米颗粒密切相关。一方面,银纳米颗粒与Ga2O3薄膜间的肖特基势垒的形成有助于减小非晶Ga2O3的暗电流;另一方面,银纳米颗粒的表面等离子振动有助于增强Ga2O3对紫外光的吸收,且紫外光照下银纳米颗粒会产生大量的热载流子使得热电子有足够的能量克服银纳米颗粒与Ga2O3薄膜间的肖特基势垒,使得探测器的光电流增加。本文工作为实现具有低暗电流和高光暗电流比的深紫外光电探测器提供了一种可行的方法。
光电探测器 氧化镓 银纳米颗粒 热电子 肖特基势垒 
光学学报
2023, 43(20): 2004003
陈星 1,2程祯 1刘可为 1,2,*申德振 1,2,**
作者单位
摘要
1 中国科学院长春光学精密机械与物理研究所 发光学及应用国家重点实验室,吉林 长春 130033
2 中国科学院大学 材料科学与光电工程研究中心,北京 100049
日盲紫外探测器在**和民用领域均具有广阔的应用前景。基于宽禁带半导体材料的日盲紫外探测器具有无需昂贵的滤光片、工作电压低、全固态、体积小、重量轻、抗干扰能力强、工作温度范围广等特点,是公认的新一代紫外探测器。在众多的宽禁带半导体材料中,以Ga2O3作为典型代表的镓基氧化物材料因其优异的电学和光电特性已经成为近年来微电子学和光电子学领域的研究热点,特别是其本征日盲、耐高温、耐高压、化学稳定性好等优异特点使得该类材料在日盲紫外光电探测领域展现出巨大的发展潜力。鉴于此,本文综述了不同晶体结构的Ga2O3、镓酸盐氧化物、镓锡氧化物、镓铝氧化物等镓基氧化物薄膜及其日盲紫外探测器研究进展。
日盲 紫外探测器 Ga2O3 镓基氧化物 镓酸盐氧化物 含镓三元合金氧化物 solar-blind ultraviolet photodetectors gallium oxide gallium-based oxide gallate oxide gallium containing ternary oxides 
发光学报
2023, 44(7): 1167
作者单位
摘要
1 山东大学,晶体材料国家重点实验室,新一代半导体材料研究院,晶体材料研究院,济南 250100
2 山东省工业技术研究院,济南 250100
β-Ga2O3作为最具发展潜力的超宽禁带半导体材料,其晶体缺陷方面还缺乏深入且全面的研究。面缺陷小角晶界主要存在于β-Ga2O3 (100)晶面,会破坏晶体结构完整性,降低晶体质量。采用化学刻蚀法和透射电子显微镜技术对导模法生长β-Ga2O3晶体中的小角晶界进行宏观分析和微观结构表征。研究表明:小角晶界两侧的刻蚀坑形状和朝向相同,晶界两侧的晶粒取向差约为3°,除此之外,小角晶界会使摇摆曲线出现肩峰及展宽,通过对β-Ga2O3晶体中小角晶界缺陷的微观结构进行表征,填补了小角晶界缺陷的研究空白。
导模法 β-氧化镓 小角晶界 摇摆曲线 edge-defined film-fed growth method β-gallium oxide low angle grain boundaries rocking curve 
硅酸盐学报
2023, 51(6): 1406
光电工程
2023, 50(6): 230005
Author Affiliations
Abstract
1 School of Information Science and Engineering, University of Jinan, Jinan 250022, China
2 School of Microelectronics, Shandong University, Jinan 250101, China
3 School of Integrated Circuits and Electronics, Beijing Institute of Technology, Beijing 100081, China
In the era of accelerated development in artificial intelligence as well as explosive growth of information and data throughput, underlying hardware devices that can integrate perception and memory while simultaneously offering the benefits of low power consumption and high transmission rates are particularly valuable. Neuromorphic devices inspired by the human brain are considered to be one of the most promising successors to the efficient in-sensory process. In this paper, a homojunction-based multi-functional optoelectronic synapse (MFOS) is proposed and testified. It enables a series of basic electrical synaptic plasticity, including paired-pulse facilitation/depression (PPF/PPD) and long-term promotion/depression (LTP/LTD). In addition, the synaptic behaviors induced by electrical signals could be instead achieved through optical signals, where its sensitivity to optical frequency allows the MFOS to simulate high-pass filtering applications in situ and the perception capability integrated into memory endows it with the information acquisition and processing functions as a visual system. Meanwhile, the MFOS exhibits its performances of associative learning and logic gates following the illumination with two different wavelengths. As a result, the proposed MFOS offers a solution for the realization of intelligent visual system and bionic electronic eye, and will provide more diverse application scenarios for future neuromorphic computing.
optoelectronic synapse gallium oxide filter visual system associative learning logic gate 
Journal of Semiconductors
2023, 44(7): 074101
Author Affiliations
Abstract
School of Physics and Optoelectronic Engineering, Shandong University of Technology, Zibo 255000, China
The anisotropic properties and applications of β-gallium oxide (β-Ga2O3) are comprehensively reviewed. All the anisotropic properties are essentially resulted from the anisotropic crystal structure. The process flow of how to exfoliate nanoflakes from bulk material is introduced. Anisotropic optical properties, including optical bandgap, Raman and photoluminescence characters are comprehensively reviewed. Three measurement configurations of angle-resolved polarized Raman spectra (ARPRS) are reviewed, with Raman intensity formulas calculated with Raman tensor elements. The method to obtain the Raman tensor elements of phonon modes through experimental fitting is also introduced. In addition, the anisotropy in electron mobility and affinity are discussed. The applications, especially polarization photodetectors, based on β-Ga2O3 were summarized comprehensively. Three kinds of polarization detection mechanisms based on material dichroism, 1D morphology and metal-grids are discussed in-depth. This review paper provides a framework for anisotropic optical and electric properties of β-Ga2O3, as well as the applications based on these characters, and is expected to lead to a wider discussion on this topic.
gallium oxide anisotropic dichroism polarization monoclinic 
Journal of Semiconductors
2023, 44(7): 071801
作者单位
摘要
1 中国科学院西安光学精密机械研究所 瞬态光学与光子技术国家重点实验室,西安 710119
2 中国科学院大学,北京 100049
3 西安中科原子精密制造科技有限公司,西安 710110
在250 ℃的低温下,以三甲基镓、四(二甲氨基)钛为前躯体源,O3为反应气体,采用热原子层沉积制备了Ti掺杂Ga2O3(TGO)薄膜。Ga2O3和TiO2的生长速率分别为0.037 nm/cycle和0.08 nm/cycle,TGO薄膜厚度低于理论计算值。X射线光电子能谱仪测试结果表明膜中Ti浓度随Ga2O3/TiO2循环比减少而增加,O 1s、Ga 2p和Ti 2p的峰位置向较低的结合能移动,这是因为Ti原子取代了Ga原子的某些位点引起了结合能降低,表明Ti元素成功掺杂到Ga2O3薄膜中。TiO2和Ga2O3的芯能级光谱分析表明薄膜中存有Ti4+和Ga3+离子。TGO薄膜的O 1s芯能级光谱中Ga-O键随着Ti-O键含量增加而下降,表明TGO薄膜中形成Ga2O3-TiO2复合材料。掠入射X射线衍射图中没有出现衍射峰,表明沉积的Ga2O3和TGO薄膜为非晶态。原子力显微镜观察到薄膜表面平整光滑,均方根粗糙度为0.377 nm,这得益于原子层沉积逐层生长的优势。TGO薄膜在可见光区表现出较高的透明度,对紫外光强烈吸收。随着Ti掺杂浓度的增加,TGO薄膜的折射率由于化学变化从1.75增加到1.99,紫外光区消光系数增大引起透过率减小,吸收边缘出现了红移,光学带隙从4.9 eV减小到4.3 eV。分光光度法和X射线光电子能谱法测定薄膜光学带隙所得的结果一致。
氧化镓薄膜 Ti掺杂Ga2O3薄膜 热原子层沉积 折射率 光学带隙 Gallium oxide thin film Ti-doped Ga2O3 thin films Thermal atomic layer deposition Refractive index Optical band gap 
光子学报
2023, 52(6): 0631002

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