利用严格耦合波理论设计出亚波长抗反射光栅,并通过等离子体辅助刻蚀制作出了立方状抗反抗光栅.测量结果发现该光栅具有良好的增透特性,并且测得光栅参数和理论设计参数基本一致,表明等离子体辅助刻蚀是制作深光栅的有效方法.对实验结果进行了分析和讨论,结果表明,临界周期点随折射率的变化规律在亚波长抗反射光栅的制作中有重要的作用.

Antireflective subwavelength grating was designed by using rigorous coupled wave approach(RCWA). The square-pillar grating was fabricated by plasma assisted etching. Testing results show that the grating has a very good antireflective characteristic, and the values of testing parameters approximately equal to the designed data. It indicates that the plasma assisted etching method is valid to fabricate deep groove grating. The experimental results are analyzed and discusssed. It is shown that the critical periodic point as a function of refractive index is very important to fabricate the antireflective aubwavelength grating.