中国激光, 1987, 14 (11): 671, 网络出版: 2012-08-10
OLD诊断SiH4的LPCVD动力学过程
Diagnosis of kinetic process in silane LPCVD by means of OLD
摘要
用光声激光偏转（OLD）测量了强TEA CO2脉冲激光辐照SiH4-H2系统产生等离子体淀积（LPCVD）硅薄膜过程中的激波效应,证明激光击穿SiH4诱发的激波效应是LPCVD中基本的气体动力学过程,并讨论了激波对膜生长的影响。
Abstract
The shock wave in SiH4 laser plasma chemical vapour deposition (LPCVD) are measured byoptoacoustic laser deflection (OLD) technique. The result shows that the shock wars induced by laser gas breakdown is the basic gaa kinetic process in LPGVD. Also discussed is its influence on thin film growth.
傅广生, 李晓苇, 韩理, 张连水, 董丽芳, 吕福润, 薛春银. OLD诊断SiH4的LPCVD动力学过程[J]. 中国激光, 1987, 14(11): 671. Fu Guangsheng, Li Xiaowei, Han Li, Zhang Lianshui, Dong Lifang, Lu Furun, Xue Chunyin. Diagnosis of kinetic process in silane LPCVD by means of OLD[J]. Chinese Journal of Lasers, 1987, 14(11): 671.
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