将模拟退火法引入柱面透镜列阵的结构参数优化过程中,并成功地利用该方法实现了不等宽单元CLA系统的性能优化工作。结果表明采用不等宽单元技术能大大改善入射光场为高斯分布型的焦线强度分布均匀性。采用不等宽5单元系统能获得<1%的调制对比度。

In this paper the simulating annealing method is introduced into the optimal design process to improve the long-range homogeneity along the line focus. The results show that the unequal width element CLA is able to improve the homogeneity along the focus line for an incident laser with both Gaussian and uniform distribution. The design results are also given.