激光与光电子学进展, 2017, 54 (11): 113103, 网络出版: 2017-11-17
磁控溅射法制备氧化钨薄膜的膜层微观结构对电致变色性能的影响 下载: 887次
Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance
摘要
利用磁控溅射法,在不同工作压强下制备了氧化钨(WO3)薄膜,研究了工作压强对WO3膜层微观结构的调控作用,并研究了WO3膜层微观结构对其电致变色性能的影响。研究结果表明,制备的WO3薄膜属于非晶相,表面呈峰状结构;随着工作压强的增大,WO3薄膜膜层微观结构变疏松,电致变色响应时间和循环寿命均减短;在最佳膜层微观结构下,WO3薄膜光学密度可达0.64,循环寿命达1500周。
Abstract
By the magnetron sputtering method, the tungsten oxide (WO3) films are prepared under different working pressures. The regulating effect of working pressure on WO3 film microstructure is studied, and the effect of WO3 film microstructure on its electrochromic performance is also investigated. The study results show that the prepared WO3 film is with an amorphous phase and its surface presents a peak-shaped structure. With the increase of working pressure, the WO3 film microstructure becomes loose, and the electrochromic response time and the cycle lifetime are shorten. Under the optimal film microstructure condition, the optical density of WO3 films is 0.64 and the cycle lifetime is up to 1500 cycles.
初文静, 张喜强, 施瑕玉, 郑友伟, 林俊良, 陈明亿, 林金锡, 林金汉, 袁宁一. 磁控溅射法制备氧化钨薄膜的膜层微观结构对电致变色性能的影响[J]. 激光与光电子学进展, 2017, 54(11): 113103. Chu Wenjing, Zhang Xiqiang, Shi Xiayu, Zheng Youwei, Lin Junliang, Chen Mingyi, Lin Jinxi, Lin Jinhan, Yuan Ningyi. Effect of Film Micro-Structure of Tungsten Oxide Films Deposited by Magnetron Sputtering on Electrochromic Performance[J]. Laser & Optoelectronics Progress, 2017, 54(11): 113103.