光学学报, 2014, 34 (9): 0905002, 网络出版: 2014-08-15
极紫外光刻含缺陷多层膜衍射谱仿真简化模型
Simplified Model for Defective Multilayer Diffraction Spectrum Simulation in Extreme Ultraviolet Lithography
补充材料
刘晓雷, 李思坤, 王向朝. 极紫外光刻含缺陷多层膜衍射谱仿真简化模型[J]. 光学学报, 2014, 34(9): 0905002. Liu Xiaolei, Li Sikun, Wang Xiangzhao. Simplified Model for Defective Multilayer Diffraction Spectrum Simulation in Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2014, 34(9): 0905002.