光学仪器, 2017, 39 (4): 90, 网络出版: 2017-10-30  

软X射线共振反射方法表征Sc/Si多层膜界面化合物成分的计算研究

Characterization of interlayer composition in Sc/Si multilayers by soft X-ray resonant reflectivity method
作者单位
同济大学 物理科学与工程学院 先进微结构材料教育部重点实验室, 上海200092
摘要
Sc/Si周期多层膜是极紫外波段的重要材料,但膜层界面处材料原子间的扩散与化合反应严重影响了多层膜反射率。为了无损表征多层膜界面化合物的成分,利用软X射线共振反射的方法,研究了Sc/Si多层膜界面化合物成分。在Si的L吸收边附近,计算了不同周期厚度以及不同界面硅化物成分的Sc/Si多层膜的共振反射率。结果表明,界面硅化物成分不同的膜系在Si的L边处的反射率有明显差异,并且反射率随着膜层中Si化合反应的消耗而降低,证实了软X射线共振反射方法在亚纳米尺度下对化合物的成分进行无损分析的可行性,为后续的实验研究提供参考。
Abstract
Periodic Sc/Si multilayers show high reflectivity in the 35-50 nm extreme ultraviolet(EUV) wavelength range.The diffusion and chemical interaction between scandium and silicon decrease the reflectivity of Sc/Si multilayer.In order to characterize the interfacial compound of Sc/Si multilayer nondestructively,soft X-ray resonant reflection method was studied in this paper.Along the Si L absorption edge,the resonant reflection of Sc/Si multilayer with different thickness and interfacial composition was calculated.The results show that the reflectivity along the Si L absorption edge is significant difference,and decreases as Si is consumed by the combination reaction in the multilayers.It indicates the feasibility of nondestructive analysis by soft X-ray resonant reflection in the sub-nanometer scale and lays a theoretical foundation for the experiment study.
参考文献

[1] FEIGLT,HEBER J,GATTO A,et al.Optics developments in the VUV-soft X-ray spectral region[J].Nuclear Instruments and Methods in Physics Research Section A:Accelerators,Spectrometers,Detectors and Associated Equipment,2002,483(1/2):351356.

[2] MACCHIETTOC D,BENWARE B R,ROCCA J J.Generation of millijoule-level soft-x-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier[J].Optics Letters,1999,24(16):11151117.

[3] USPENSKIIY A,LEVASHOV V E,VINOGRADOV A V,et al.Sc-Si normal incidence mirrors for a VUV interval of 35-50 nm[J].Nuclear Instruments and Methods in Physics Research Section A:Accelerators,Spectrometers,Detectors and Associated Equipment,2000,448(1/2):147151.

[4] OKAMOTO H.Sc-Si(scandium-silicon)[J].Journal of Phase Equilibria,1992,13(6):679681.

[5] PARRATTL G.Surface studies of solids by total reflection of X-rays[J].Physical Review,1954,95(2):359369.

[6] NVOT L,CROCE P.Caractérisation des surfaces par réflexion rasante de rayons X.Application à l’étude du polissage de quelques verres silicates[J].Revue De Physique Appliquée,1980,15(3):761779.

[7] MATERLIK G,SPARKS C J,FISCHER K.Resonant anomalous X-ray scattering-theory and applications[M].Amsterdam:North-Holland,1994.

[8] SHPYRKO O G,GRIGORIEV A Y,STREITEL R,et al.Atomic-scale surface demixing in a eutectic liquid BiSn alloy[J].Physical Review Letters,2005,95(10):106103.

[9] LEED R,SINHA S K,HASKEL D,et al.X-ray resonant magnetic scattering from structurally and magnetically rough interfaces in multilayered systems.I.Specular reflectivity[J].Physical Review B,2003,68(22):224409.

[10] KORTRIGHT J B,KIM S K,DENBEAUX G P,et al.Soft-x-ray small-angle scattering as a sensitive probe of magnetic and charge heterogeneity[J].Physical Review B,2001,64(9):092401.

[11] VAKNIN D,KRGER P,LSCHE M.Anomalous x-ray reflectivity characterization of ion distribution at biomimetic membranes[J].Physical Review Letters,2003,90(17):178102.

[12] WANG C,ARAKI T,ADE H.Soft x-ray resonant reflectivity of low-Z material thin films[J].Applied Physics Letters,2005,87(21):214109.

[13] BORN M,WOLF E.Principles of Optics[M].6th ed.Oxford:Pergamon Press,1980.

[14] 母国光,战元龄.光学[M].2版.北京:高等教育出版社,2009.

[15] ZACHARIASEN W H.Theory of X-ray diffraction in crystals with stacking faults[J].Acta Crystallographica,1967,23(1):4449.

[16] LIPSON H.Diffraction physics by J.M.Cowley[J].Acta Crystallographica Section A,1976,32(4):748749.

[17] GAUTIER J,DELMOTTE F,ROULLIAY M,et al.Performances and stability of Sc/Si multilayers with barrier layers for wavelengths around 46 nm[C]∥Proceedings of SPIE 5963,Advances in Optical Thin Films II.Jena,Germany:SPIE,2005.

朱圣明, 李淼. 软X射线共振反射方法表征Sc/Si多层膜界面化合物成分的计算研究[J]. 光学仪器, 2017, 39(4): 90. ZHU Shengming, LI Miao. Characterization of interlayer composition in Sc/Si multilayers by soft X-ray resonant reflectivity method[J]. Optical Instruments, 2017, 39(4): 90.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!