光学学报, 2016, 36 (8): 0812001, 网络出版: 2016-08-18
纳米光刻中调焦调平测量系统的工艺相关性 下载: 741次
Process Dependency of Focusing and Leveling Measurement System in Nanoscale Lithography
补充材料
孙裕文, 李世光, 叶甜春, 宗明成. 纳米光刻中调焦调平测量系统的工艺相关性[J]. 光学学报, 2016, 36(8): 0812001. Sun Yuwen, Li Shiguang, Ye Tianchun, Zong Mingcheng. Process Dependency of Focusing and Leveling Measurement System in Nanoscale Lithography[J]. Acta Optica Sinica, 2016, 36(8): 0812001.