光学 精密工程, 2018, 26 (3): 588, 网络出版: 2018-04-25
用于曲面光栅刻蚀的工作台轨迹拟合及测试误差分析
Trajectory-fitting and testing error analysis of stage for curved grating etching
补充材料
沈晨, 谭鑫, 朱继伟, 张伟, 齐向东. 用于曲面光栅刻蚀的工作台轨迹拟合及测试误差分析[J]. 光学 精密工程, 2018, 26(3): 588. SHEN Chen, TAN Xin, ZHU Ji-wei, ZHANG Wei, QI Xiang-dong. Trajectory-fitting and testing error analysis of stage for curved grating etching[J]. Optics and Precision Engineering, 2018, 26(3): 588.