光学学报, 2018, 38 (12): 1222003, 网络出版: 2019-05-10
射流抛光中抛光液黏度对材料去除函数的影响 
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Influence of Polishing Slurry Viscosity on the Material Removal Function for Fluid Jet Polishing
图 & 表
图 3. 抛光液黏度为1.01 mPa·s,入射速度为30 m/s时的计算结果。(a)流体速度分布;(b)磨粒运动轨迹
Fig. 3. Calculation results under 1.01 mPa·s polishing slurry viscosity and 30 m/s incident velocity conditions. (a) Velocity of liquid; (b) pathlines of abrasive particles
图 4. 不同黏度离散相模型计算结果对比。(a)磨粒碰撞速度分布;(b)磨粒碰撞角度分布
Fig. 4. Comparison of calculation results of DPM under different viscosity conditions. (a) Velocity distribution of abrasive particles; (b) angle distribution of abrasive particles
图 5. 抛光液黏度对磨粒最大碰撞速度的影响
Fig. 5. Influence of the polishing slurry viscosity on the maximum impact velocity of abrasive particles
图 6. 射流抛光系统结构示意图(左)与实物图(右)
Fig. 6. Schematic (left) and labeled photo (right) of fluid jet polishing system
图 7. 入射速度为30 m/s,1#抛光液条件下的抛光斑
Fig. 7. Polishing spot under 1# polishing slurry with 30 m/s incident velocity
图 8. 不同黏度抛光液下材料去除函数实验与计算结果对比。(a) 1# 抛光液;(b) 2#抛光液;(c) 3#抛光液;(d) 4#抛光液;(e) 5#抛光液
Fig. 8. Comparison between the material removal functions obtained by experiments and calculation under different polishing slurry viscosity conditions. (a) 1# polishing slurry; (b) 2# polishing slurry; (c) 3# polishing slurry; (d) 4# polishing slurry; (e) 5# polishing slurry
图 9. 实际参与材料去除的磨粒比例系数随黏度变化规律
Fig. 9. Variation law of wear-particle proportion coefficient with viscosity change in material removal
图 10. 去除函数特征量随黏度变化规律。(a)最大去除深度;(b)去除函数峰值间距
Fig. 10. Variation law of characteristic quantity of removal function for different viscosities. (a) Maximum material removal depth; (b) distance between removal peaks
图 11. 使用不同黏度抛光液均匀抛光后的工件表面粗糙度对比。(a) 1#抛光液,Ra=7.778 nm;(b) 5#抛光液,Ra=1.445 nm
Fig. 11. Comparison of surface roughness of workpieces after uniform polishing using different polishing slurry viscosities. (a) 1# polishing slurry, Ra=7.778 nm; (b) 5# polishing slurry, Ra=1.445 nm
表 1抛光液参数
Table1. Polishing slurry parameters
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表 2磨损模型参数表
Table2. Parameters of the erosion model
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孙鹏飞, 张连新, 李建, 王中昱, 周涛. 射流抛光中抛光液黏度对材料去除函数的影响[J]. 光学学报, 2018, 38(12): 1222003. Pengfei Sun, Lianxin Zhang, Jian Li, Zhongyu Wang, Tao Zhou. Influence of Polishing Slurry Viscosity on the Material Removal Function for Fluid Jet Polishing[J]. Acta Optica Sinica, 2018, 38(12): 1222003.
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