中国激光, 2017, 44 (9): 0905002, 网络出版: 2017-09-07
扫描干涉场曝光系统光斑尺寸与光路设计 下载: 865次
Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System
引用该论文
王玮, 姜珊, 宋莹, 巴音贺希格. 扫描干涉场曝光系统光斑尺寸与光路设计[J]. 中国激光, 2017, 44(9): 0905002.
Wang Wei, Jiang Shan, Song Ying, Bayanheshig. Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System[J]. Chinese Journal of Lasers, 2017, 44(9): 0905002.
王玮, 姜珊, 宋莹, 巴音贺希格. 扫描干涉场曝光系统光斑尺寸与光路设计[J]. 中国激光, 2017, 44(9): 0905002. Wang Wei, Jiang Shan, Song Ying, Bayanheshig. Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System[J]. Chinese Journal of Lasers, 2017, 44(9): 0905002.