[1] Boulouz M, Boulouz A, Giani A et al.. Influence of substrate temperature and target composition on the properties of yitta-stabilized thin films grown by R F. reactive magnetron sputtering. Thin Solid Films, 1998, 323:85～92

[2] Gao Pengtao, Meng L G, dos Santos M P. Influence of sputtering power and the substrate-target distance on the properties of ZrO2 films prepared by RF reactive sputtering. Thin Solid Films, 2000, 377～378:557～561

[3] Mehner A, Klümper-Westkamp H, Hoffman F. Crystallization and residual stress formation of sol-gel-derived zirconia films. Thin Solid Films, 1997, 308～309:363～368

[4] Tamulevicius S. Stress and strain in the vacuum deposited thin films. Vacuum, 1998, 51(2):127～138

[5] Thielsch R, Gatto A, Kaiser N. Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region. Appl. Opt., 2002, 41(16):3211～3216

[6] Actuok L. Thin Film Physics (薄膜物理学). Beijing: Publishing Company of Science, 1986. 68～112 (in Chinese)

[7] Zhang Guobing, Hao Yilong. Residual stress properties of polysilicon thin Film. Chin. J. Semiconductors (半导体学报), 2000, 20(6):463～467 (in Chinese)

[8] Wu Guifang, Shi Shouhua. Influence of annealing temperature on microstructure and stress of sputtered Cu film on Si substrate. Vacuum Science and Technology(真空科学与技术学报), 2002, 22(5):139～142 (in Chinese)