光刻对准中掩模光栅标记成像标定方法
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朱江平, 胡松, 于军胜, 唐燕, 周绍林, 何渝. 光刻对准中掩模光栅标记成像标定方法[J]. 中国激光, 2013, 40(1): 0108002. Zhu Jiangping, Hu Song, Yu Junsheng, Tang Yan, Zhou Shaolin, He Yu. Calibration Method for Mask Grating Mark Imaging in Lithography Alignment[J]. Chinese Journal of Lasers, 2013, 40(1): 0108002.