中国激光, 2019, 46 (10): 1003001, 网络出版: 2019-10-25
脉冲激光沉积法制备低阻掺镓氧化锌薄膜及其光电性能 下载: 1328次
Preparation of Low-Resistivity GZO Thin Films Using Pulsed Laser Deposition and Investigation of Optoelectronic Properties
图 & 表
图 1. 不同氧气分压下沉积的GZO薄膜的XRD图谱
Fig. 1. XRD patterns of GZO films deposited at different oxygen pressures
图 2. 不同氧气分压下沉积的GZO薄膜的AFM形貌。 (a) 0 Pa; (b) 0.5 Pa;(c) 1.0 Pa;(d) 5.0 Pa
Fig. 2. AFM images of GZO films deposited under different oxygen pressures. (a) 0 Pa; (b) 0.5 Pa; (c) 1.0 Pa; (d) 5.0 Pa
图 3. GZO薄膜的电阻率、载流子浓度、霍尔迁移率随氧气分压的变化曲线。(a)电阻率随氧气分压的变化;(b)载流子浓度和霍尔迁移率随氧气分压的变化
Fig. 3. Resistivity of GZO film, carrier density, and Hall mobility vary with oxygen pressure. (a) Resistivity varies with oxygen pressure; (b) carrier density and Hall mobility vary with oxygen pressure
图 4. 不同氧气分压下GZO薄膜的透过率曲线
Fig. 4. Optical transmittance of GZO thin films under different oxygen pressures
表 1不同氧气分压下GZO薄膜的微观特性参数
Table1. Microstructure parameters of GZO films under different oxygen pressures
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莫观孔, 刘家辉, 邹卓良, 唐子媚, 刘宇伦, 何欢, 符跃春, 沈晓明. 脉冲激光沉积法制备低阻掺镓氧化锌薄膜及其光电性能[J]. 中国激光, 2019, 46(10): 1003001. Guankong Mo, Jiahui Liu, Zhuoliang Zou, Zimei Tang, Yulun Liu, Huan He, Yuechun Fu, Xiaoming Shen. Preparation of Low-Resistivity GZO Thin Films Using Pulsed Laser Deposition and Investigation of Optoelectronic Properties[J]. Chinese Journal of Lasers, 2019, 46(10): 1003001.