International Journal of Extreme Manufacturing, 2020, 2 (1): 012005, Published Online: Jun. 4, 2020
The recent development of soft x-ray interference lithography in SSRF
Basic Information
| DOI: | 10.1088/2631-7990/ab70ae |
| 中图分类号: | -- |
| 栏目: | Topical Review |
| 项目基金: | This work was performed at the SSRF XIL beamline (BL08U1B). Financial support was provided by the National Key R&D Program of China (2017YFA0206001), the National Key Basic Research Program of the China Science and Technology Commission of Shanghai Municipality (17JC1400802), and the National Natural Science Foundation of China (Nos. 11775291, 11875314). |
| 收稿日期: | Dec. 3, 2019 |
| 修改稿日期: | Jan. 21, 2020 |
| 网络出版日期: | Jun. 4, 2020 |
| 通讯作者: | Yanqing Wu (wuyanqing@sinap.ac.cn and tairenzhong@sinap.ac.cn) |
| 备注: | -- |
Jun Zhao, Shumin Yang, Chaofan Xue, Liansheng Wang, Zhaofeng Liang, Lei Zhang, Yong Wang, Yanqing Wu, Renzhong Tai. The recent development of soft x-ray interference lithography in SSRF[J]. International Journal of Extreme Manufacturing, 2020, 2(1): 012005.
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