The recent development of soft x-ray interference lithography in SSRF | International Journal of Extreme Manufacturing -- 中国光学期刊网

International Journal of Extreme Manufacturing, 2020, 2 (1): 012005, Published Online: Jun. 4, 2020

The recent development of soft x-ray interference lithography in SSRF

Jun Zhao ^1,2Shumin Yang ^1,2Chaofan Xue ^1,2Liansheng Wang ^1,2Zhaofeng Liang ¹Lei Zhang ²Yong Wang ^1,2Yanqing Wu ^1,2,*Renzhong Tai ^1,2

Author Affiliations

¹ Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, CAS, Shanghai, People’s Republic of China

² Shanghai Institute of Applied Physical, CAS, Shanghai, People’s Republic of China

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Jun Zhao, Shumin Yang, Chaofan Xue, Liansheng Wang, Zhaofeng Liang, Lei Zhang, Yong Wang, Yanqing Wu, Renzhong Tai. The recent development of soft x-ray interference lithography in SSRF[J]. International Journal of Extreme Manufacturing, 2020, 2(1): 012005.

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