International Journal of Extreme Manufacturing, 2020, 2 (1): 012005, Published Online: Jun. 4, 2020  

The recent development of soft x-ray interference lithography in SSRF

Author Affiliations
1 Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, CAS, Shanghai, People’s Republic of China
2 Shanghai Institute of Applied Physical, CAS, Shanghai, People’s Republic of China
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Jun Zhao, Shumin Yang, Chaofan Xue, Liansheng Wang, Zhaofeng Liang, Lei Zhang, Yong Wang, Yanqing Wu, Renzhong Tai. The recent development of soft x-ray interference lithography in SSRF[J]. International Journal of Extreme Manufacturing, 2020, 2(1): 012005.

References

[1] Harun H S, David C, Gobrecht J, Golovkina V, Cerrina F, Kim S O and Nealey P F 2003 Microelectron. Eng. 67–8 56–62

[2] Harun H S 2005 Microelectron. Eng. 78-79 410–6

[3] Nassir M, Daniel F, Jens G and Yasin E 2014 Opt. Lett. 39 2286–9

[4] Zhengjun L, Kari I, Nikolai C, Kestutis G and Ilkka T 2013 Nanotechnology 24 175304

[5] Li H, Ye T, Shi L and Xie C 2017 J. Micromech. Microeng. 27 124002

[6] Xie C, Zhu X, Niu J, Li H, Liu M, Chen B, Hu Y and Shi L 2011 Acta Opt. Sin. 31 0900128

[7] Chao W, Keith J M, Zengli F, Wen-Di L and Stephen Y C 2011 Nanotechnology 22 445301

[8] Wang L, Harun H S and Yasin E 2012 Nanotechnology 23 305303

[9] Nassir M, Jens. G and Yasin E 2015 Microelectron. Eng. 143 55–63

[10] Birgit P, Andreas L, Eugenie K, Christian D and Yasin E 2011 Nanotechnology 22 37

[11] Yang S M, Wang L S, Zhao J, Xue C F, Liu H G, Xu Z J, Wu Y Q and Tai R Z 2015 Nucl. Sci. Tech. 26 010101

[12] Vaida A et al 2009 J. Micro/Nanolith. Mems Moems 8 021204

[13] Matthias D, Tugce N G, Amitav S, Nicholas D S and Celestino P 2015 ACS Appl. Mater. Interfaces 7 11337–45

[14] Yasuyuki F, Yuya Y, Takafumi I, Takuro U, Tetsuo H, Takeo W and Kinoshita H 2011 Microelectron. Eng. 88 1944–7

[15] Zuhal T, Michaela V, Iacopo M, Karen G O, Marieke M, Oktay Y, Rik H, Gijsbert R, Rolf C and Yasin E 2018 Proc. SPIE 10583 105831W

[16] Roel G, Harun H S, Yasin E, Amandine J and Frieda V R 2006 Microelectron. Eng. 83 1103–6

[17] Daniel F, Hans S, Ralph S and Yasin E 2017 Phys. Rev. B 96 115307

[18] Yogesh J, Shankar K J, Mario A, J?rg F L and Yasin E 2007 Nat. Photon. 1 41

[19] Hideaki T, Shinji T, Toru F, Hiroo T and Takahiro G 2014 Proc. SPIE 9048 90481E

[20] John W, Cheng Y C, Artak I, Quinn L, Mike F, Mike G, Joseph B, Paul N and Franco C 2007 Nucl. Instrum. Methods Phys. Res. A 582 254–7

[21] Yasin E, Harun H S, Celestino P, Jens G, Mark P S and Paul F N 2007 Microelectron. Eng. 84 700–4

[22] Jintang H, Daniel F, Yasin E and Celestino P 2015 Microelectron. Eng. 141 32–6

[23] Waiz K, Simon A T, Mehtap O, Thomas J S, Jens G, Jeroen A B and Yasin E 2015 Nanoscale 7 7386

[24] Yasin E, Michaela V, Nassir M and Daniel F 2014 Proc. SPIE 9048 904804

[25] Urayama T, Watanabe T, Yamaguchi Y, Matsuda N, Fukushima Y, Iguchi T, Harada T and Kinoshita H 2011 J. Photopolymer Sci. Technol. 24 153–7

[26] Lin C H, Fong C H, Lin Y M, Lee Y Y, Fung H S and Shew B Y 2011 Microelectron. Eng. 88 2639–43

[27] Lin C H, Lin Y M, Liang C C, Lee Y Y, Fung H S, Shew B Y and Chen S H 2012 Microelectron. Eng. 98 194–7

[28] Artak I, Wüest A, John W, Fan J and Franco C 2016 Opt. Express 16 9106

[29] Mojarad N, Hojeij M, Wang L, Gobrecht J and Ekinci Y 2015 Nanoscale 7 4031

[30] Meijer T, Beardmore J P, Fabrie C G C H M, van Lieshout J P, Notermans R P M J W, Sang R T, Vredenbregt E J D and van Leeuwen K A H 2011 Appl. Phys. B 105 703–13

[31] Wang L, Solak H and Ekinci Y 2012 Nanotechnology 23 305303

[32] Pingping Z, Shumin Y, Liansheng W, Jun Z, Zhichao Z, Bo L, Jun Z and Xuhui S 2014 Nanotechnology 25 245301

[33] Parisse P, Luciani D, D’Angelo A, Santucci S, Zuppella P, Tucceri P, Reale A and Ottaviano L 2009 Mater. Sci. Eng. B 165 227–30

[34] Chaofan X, Yanqing W, Fangyuan Z, Shumin Y, Haigang L, Jun Z, Liansheng W and Renzhong T 2016 Rev. Sci. Instrum. 87 043303

[35] Jun Z, Yanqing W, Chaofan X, Shumin Y, Liansheng W, Fangyuan Z, Zhichao Z, Bo L, Yong W and Renzhong T 2017 Microelectron. Eng. 170 49–53

[36] Chaofan X et al 2017 Appl. Surf. Sci. 425 553–7

[37] Birgit P, Hannes M, Reto G, Luca B, Sergey G, Christian D, Jorg F L, Thomas F and Yasin E 2011 Acs Nano 5 6374–82

[38] Zhang X, Deng R, Yang F, Jiang C, Xu S and Li M 2018 ACS. Photonics 5 2997–3002

[39] Li Z, Butun S and Aydin K 2014 ACS Nano 8 8242–8

[40] Shumin Y, Chaofan X, Jun Z, Liansheng W, Yanqing W and Renzhong T 2019 Nanotechnology 30 315301

[41] Huijuan X, Shumin Y, Liansheng W, Jun Z, Chaofan X, Yanqing W and Renzhong T 2019 Chin. Opt. Lett. 17 062201

[42] Li L, Liu X, Pal S, Wang S L, Ober C K and Giannelis E P 2017 Soc. Rev. 46 4855–66

[43] Allen R D, Thackeray J W and Somervell M H 2011 Proc. SPIE 7972 797204

[44] Tomoki N et al 2016 J. Photopolymer Sci. Technol. 29 475–8

[45] Carmen P, Andreas F, Alexandra M, John R, Yasin E and Alex P G 2017 SPIE Adv. Lithography 10143 101430V

[46] Yildirim O et al 2017 SPIE Adv. Lithography 10143 101430Q

[47] Zuhal T, Xiaolong W, Iacopo M, Lidia van Lent P, Marieke M, Rolf C, Gijsbert R, Rik H and Ekinci Y 2018 Proc. SPIE 10809 108090L

[48] Li C et al 2014 Sci. China Chem. 57 1746–50

[49] Jinping C et al 2019 ACS Appl. Polym. Mater. 1 526–34

[50] Zhichao Z et al 2017 Appl. Phys. Lett. 110 051901

[51] Zhichao Z et al 2015 Appl. Phys. Lett. 106 241901

[52] Shuang W et al 2016 Opt. Express 24 231

[53] Qiang W, Bo L, Zhichao Z, Mu G, Hong C, Chaofan X, Jun Z, Yanqing W, Renzhong T and Xiaoping O 2018 Sci. Rep. 8 9254

[54] Xiaolin H et al 2016 Appl. Opt. 55 148–52

[55] Ming Y et al 2015 J. Alloys Compd. 621 244–9

[56] Xiaolin et al 2017 J. Appl. Phys. 121 153105

[57] Libin S et al 2016 Opt. Express 24 19112

[58] Qingjun W et al 2019 Opt. Lett. 44 1031

Jun Zhao, Shumin Yang, Chaofan Xue, Liansheng Wang, Zhaofeng Liang, Lei Zhang, Yong Wang, Yanqing Wu, Renzhong Tai. The recent development of soft x-ray interference lithography in SSRF[J]. International Journal of Extreme Manufacturing, 2020, 2(1): 012005.

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