The recent development of soft x-ray interference lithography in SSRF

Jun Zhao; Shumin Yang; Chaofan Xue; Liansheng Wang; Zhaofeng Liang; Lei Zhang; Yong Wang; Yanqing Wu; Renzhong Tai

doi:doi:10.1088/2631-7990/ab70ae

International Journal of Extreme Manufacturing, 2020, 2 (1): 012005, Published Online: Jun. 4, 2020

The recent development of soft x-ray interference lithography in SSRF

Jun Zhao ^1,2Shumin Yang ^1,2Chaofan Xue ^1,2Liansheng Wang ^1,2Zhaofeng Liang ¹Lei Zhang ²Yong Wang ^1,2Yanqing Wu ^1,2,*Renzhong Tai ^1,2

Author Affiliations

¹ Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, CAS, Shanghai, People’s Republic of China

² Shanghai Institute of Applied Physical, CAS, Shanghai, People’s Republic of China

Suppl. Mat.

Jun Zhao, Shumin Yang, Chaofan Xue, Liansheng Wang, Zhaofeng Liang, Lei Zhang, Yong Wang, Yanqing Wu, Renzhong Tai. The recent development of soft x-ray interference lithography in SSRF[J]. International Journal of Extreme Manufacturing, 2020, 2(1): 012005.