激光与光电子学进展, 2015, 52 (11): 111202, 网络出版: 2015-11-09  

一维相移剪切干涉仪的调制度函数分析

Analysis of Modulation Function in the One-Dimensional Phase Shifting Lateral Shearing Interferometry
作者单位
1 中国科学院光电技术研究所, 四川 成都 610209
2 电子科技大学光电信息学院, 四川 成都 610054
3 中国科学院大学, 北京 100049
摘要
为了分析一维相移剪切干涉仪中调制度的变化规律和影响。研究了一维光栅相移剪切干涉仪的基本原理,推导了干涉光强公式和光强调制度函数。通过将泽尼克单项像差代入到调制度函数因子,分析了泽尼克像差、剪切比对调制度函数的影响,发现测量范围主要受到高级球差和大剪切比限制。设计了一维相移剪切干涉仪的可见光实验装置,在632.8 nm 波长分别使用周期为9 μm、18 μm 一维光栅测量了一个NA=0.25 显微物镜的波像差,实验结果表明:光栅周期为18 μm 时可以正确测量,光栅周期为9 μm 时,调制度存在反转点,像差超出测量范围,并验证调制度函数分析结果的正确性。
Abstract
In order to analyze the variation rule and influence of the modulation in the one-dimensional phase shifting lateral shearing interferometer (PS LSI). The principle of the PS LSI based on one-dimensional Ronchi grating is researched. The inference intensity formula and intensity modulation function are reduced. By substituting the each Zernike aberration into the modulation function factor, the influence due to Zernike aberration and shear ratio are analyzed. The measurement range is mainly limited by the high order spherical aberration and large shear ratio. Finally, an experimental setup is designed to measure the wavefront aberration of a NA=0.25 microscope objective at 632.8 nm wavelength, in which using two one-dimensional gratings with 9 μm and 18 μm period respectively. The results show that when grating period is 18 μm, the measurement result is correct; when grating period is 9 μm, the reversed points exist in the modulation, the aberration is beyond the measurement range, and the correctness of the modulation function analysis result is validated.
参考文献

[1] 刘克, 李艳秋. 极紫外光刻投影物镜波像差在线检测技术[J]. 中国激光, 2009, 36(s2): 257-262.

    Liu Ke, Li Yanqiu. At- wavelength interferometry of projection optics for extreme ultraviolet lithography[J]. Chinese J Lasers, 2009, 36(s2): 257-262.

[2] K A Goldberg, E Tejnil, Sang Hun Lee, et al.. Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry[C]. SPIE, 1997, 3048: 264-270.

[3] Y Ohsaki, T Mori, Y Koga, et al.. A new on-machine measurement system to measure wavefront aberrations of projection optics with hyper-NA[C]. SPIE, 2006, 6154: 615424.

[4] T Fujii, J Kougo, Y Mizuno, et al.. Portable phase measuring interferometer using Shack- Hartmann method[C]. SPIE, 2003, 5038: 726-732.

[5] A K Ray-Chaudhuri, K D Krenz, R P Nissen, et al.. Initial results from an extreme ultraviolet interferometer operating with a compact laser plasma source[J]. J Vac Sci Technol B, 1996, 14(6): 3964-3968.

[6] A A MacDowell, O R Wood, J E Bjorkholm. Interferometric testing of EUV lithography cameras[C]. SPIE, 1997, 3152: 202-210.

[7] K Murakami, J Saito, K Ota, et al.. Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes[C]. SPIE, 2003, 5037: 257-264.

[8] K Sugisaki, M Okada, Z Yucong, et al.. Comparisons between EUV at- wavelength metrological methods[C]. SPIE, 2005, 5921: 59210D.

[9] P P Naulleaua, K A Goldberg, J Bokor. Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system[J]. J Vac Sci Technol B, 2000, 18(6): 2939-2943.

[10] M Hasegawa, C Ouchi, T Haseqawa, et al.. Recent progress of EUV wavefront metrology in EUVA[C]. SPIE, 2004, 5533: 27-36.

[11] Zhixiang Liu, Tingwen Xing, Yadong Jiang, et al.. Two- dimension lateral shearing interferometry for microscope objective wavefront metrology[C]. SPIE, 2014, 9272: 92721B.

[12] Hai Wang, Yanqiu Li, Ke Liu. Approach to characterize manufacture tolerances of two-dimensional cross-phase grating [J]. Opt Eng, 2013, 52(10): 104101.

[13] 何煦, 向阳. 数字横向剪切干涉仪相移技术[J]. 光学精密工程, 2013, 21(9): 2245-2251.

    He Xu, Xiang Yang. Phase-shifting technology of digital lateral shearing interferometer[J]. Optics and Precision Engineering, 2013, 21(9): 2245-2251.

[14] 方超, 向阳. 十三步光栅横向剪切干涉相位复原算法[J]. 中国激光, 2014, 41(5): 0508003.

    Fang Chao, Xiang Yang. A thirteen- step phase restoration algorithm in lateral shearing interferometry[J]. Chinese J Lasers, 2014, 41(5): 0508003.

[15] 李杰, 唐锋, 王向朝, 等. 光栅横向剪切干涉仪及其系统误差分析[J]. 中国激光, 2014, 41(5): 0508006.

    Li Jie, Tang Feng, Wang Xiangzhao, et al.. System errors analysis of grating lateral shearing interferometer[J]. Chinese J Lasers, 2014, 41(5): 0508006.

[16] D Malacara. Optical Shop Testing[M]. 3rd ed. New York: John Wiley and Sons Press, 2007: 122-126.

刘志祥, 邢廷文, 蒋亚东, 吕保斌. 一维相移剪切干涉仪的调制度函数分析[J]. 激光与光电子学进展, 2015, 52(11): 111202. 刘志祥, 邢廷文, 蒋亚东, 吕保斌. Analysis of Modulation Function in the One-Dimensional Phase Shifting Lateral Shearing Interferometry[J]. Laser & Optoelectronics Progress, 2015, 52(11): 111202.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!