[1] Semiconductor industryassociation. 2015 international technology roadmap for semiconductor (ITRS)[R]. Washington, D.C.: SIA, 2015.

[2] MackC. Fundamental principles of optical lithography[M]. UK: John Wiley & Sons, Ltd, 2007: 419- 449.

[3] Rosenbluth A E, Bukofsky S J, Hibbs M S, et al. Optimum mask and source patterns to print a given shape[J]. Proceedings of SPIE, 2001, 4346: 486-502.

[4] Armellin L P, Torsy A, Hernan K, et al. Illumination conditions matching for critical layers manufacturing in a production context[J]. Proceedings of SPIE, 2006, 6154: 61543V.

[5] Socha R, Shao W J, Xie X, et al. Improved fab CDU with FlexRay and LithoTuner[J]. Proceedings of SPIE, 2011, 7973: 79730Q.

[6] Bekaert J, van Look L, Bisschop P D, et al. . Experimental proximity matching of ArF scanners[J]. Proceedings of SPIE, 2008, 7140: 714027.

[7] He Y, Byers E, Light S, et al. Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology[J]. Proceedings of SPIE, 2010, 7640: 764014.

[8] Mulder M, Engelen A, Noordman O, et al. Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems[J]. Proceedings of SPIE, 2009, 7520: 75200Y.

[9] He Y, Serebryakov A, Light S, et al. A study on the automation of scanner matching[J]. Proceedings of SPIE, 2013, 8683: 86830W.

[10] Flagello D G, Geh B, Socha R, et al. Understanding illumination effects for control of optical proximity effects (OPE)[J]. Proceedings of SPIE, 2008, 6924: 69241U.

[11] Fühner T, Erdmann A. Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm[J]. Proceedings of SPIE, 2005, 5754: 415-426.

[12] 王磊, 李思坤, 王向朝, 等. 基于粒子群优化算法的光刻机光源优化方法[J]. 光学学报, 2015, 35(4): 0422002.

    Wang L, Li S K, Wang X Z, et al. Source optimization using particle swarm optimization algorithm in optical lithography[J]. Acta Optica Sinica, 2015, 35(4): 0422002.

[13] Zimmermann J, Gräupner P, Neumann J T, et al. Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners[J]. Proceedings of SPIE, 2010, 7640: 764005.

[14] Lai K, Rosenbluth A E, Bagheri S, et al. Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22 nm logic lithography process[J]. Proceedings of SPIE, 2009, 7274: 72740A.

[15] Wei L D, Li Y Q. Hybrid approach for the design of mirror array to produce freeform illumination sources in immersion lithography[J]. Optik, 2014, 125(20): 6166-6171.

[16] StornR, PriceK. Minimizing the real functions of the ICEC'96 contest by differential evolution[C]//Proceedings of IEEE International Conference on Evolutionary Computation, May 20-22, 1996, Nagoya, Japan. New York: IEEE, 1996: 842- 844.

[17] Zhang JQ, Sanderson AC. JADE: self-adaptive differential evolution with fast and reliable convergence performance[C]//2007 IEEE Congress on Evolutionary Computation, September 25-28, 2007, Singapore. New York: IEEE, 2007: 2251- 2258.

[18] Aldana R, Vellanki V, Shao W J, et al. Model-based scanner tuning for process optimization[J]. Proceedings of SPIE, 2011, 7985: 79850L.

[19] Wong A KK. Optical imaging in projection microlithography[M]. Bellingham: SPIE Press, 2005: 151- 155.

[20] Beak D H, Shin J H, Park T, et al. Scanner-to-scanner CD analysis and control in an HVM environment[J]. Proceedings of SPIE, 2017, 10147: 101470A.

[21] Liberman V, Rothschild M. Sedlacek J H C, et al. Marathon testing of optical materials for 193-nm lithographic applications[J]. Proceedings of SPIE, 1999, 3578: 2-15.