光学学报, 2019, 39 (12): 1222002, 网络出版: 2019-12-06
基于差分进化算法的光刻机匹配方法 下载: 1394次
Lithographic Tool-Matching Method Based on Differential Evolution Algorithm
图 & 表
图 1. 基于MMA的自由照明光源系统示意图
Fig. 1. Schematic of freeform illumination source system based on MMA
图 2. 基于MMA的自由照明光源模型示意图。(a)单个微反射镜生成的光斑;(b) MMA生成的理想光源;(c)目标光源
Fig. 2. Schematic of freeform illumination source model based on MMA. (a) Light spot formed by single micro mirror; (b) ideal source formed by MMA; (c) target source
图 3. 基于DE算法的光刻机匹配流程图
Fig. 3. Matching flowchart of lithography machine based on DE algorithm
图 4. 光刻机匹配的部分设置。(a) TBM光刻机波像差;(b)四极照明参考光源;(c) CD为45 nm的一维线空掩模
Fig. 4. Partial settings of lithography matching. (a) Wave aberration of TBM lithography; (b) reference source of quasar illumination; (c) one-dimensional line/space mask with 45 nm CD
图 5. 基于PSO-SA的匹配方法匹配后的照明光源。(a)经光源优化生成的光源;(b)通过MAA生成参数后重构的光源;(c) SO优化光源和MAA生成光源的差异
Fig. 5. Illumination source after matching based on PSO-SA. (a) Source after source optimization; (b) source reconstructed after generating parameters through MAA; (c) difference between SO optimization source and source generated by MAA
图 7. 匹配后的照明光源。(a)基于GA-SA匹配后的重构光源;(b)采用本文方法匹配后的光源;(c) MMA理想光源分布
Fig. 7. Illumination source after matching. (a) Source reconstructed by GA-SA matching; (b) source after matching by proposed method; (c) MMA ideal source distribution
图 8. 匹配前后CD误差随图形周期的变化。(a) H方向;(b) V方向
Fig. 8. CD error versus pitch before and after matching. (a) H direction; (b) V direction
图 10. 匹配前后的光源。(a)自由照明参考光源;(b) GA-SA方法匹配后的光源;(c) PSO-SA方法匹配后的光源;(d)本方法匹配后的光源
Fig. 10. Sources before and after matching. (a) Reference source of freeform illumination; (b) source after matching by GA-SA; (c) source after matching by PSO-SA; (d) source after matching by proposed method
表 1四极照明匹配模拟结果
Table1. Simulation results under quasar illumination matching
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表 2自由照明匹配模拟结果
Table2. Simulation results under freeform illumination matching
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茅言杰, 李思坤, 王向朝, 韦亚一. 基于差分进化算法的光刻机匹配方法[J]. 光学学报, 2019, 39(12): 1222002. Yanjie Mao, Sikun Li, Xiangzhao Wang, Yayi Wei. Lithographic Tool-Matching Method Based on Differential Evolution Algorithm[J]. Acta Optica Sinica, 2019, 39(12): 1222002.