中国光学, 2011, 4 (1): 86, 网络出版: 2011-04-01   

不同气体环境下532 nm激光诱导硅表面形貌的研究

Surface morphology of silicon induced by 532 nm nanosecond laser under different ambient atmospheres
作者单位
西南科技大学 理学院 激光与光电子实验室,极端条件物质特性实验室,四川 绵阳 621010
引用该论文

杨宏道, 李晓红, 李国强, 袁春华, 邱荣. 不同气体环境下532 nm激光诱导硅表面形貌的研究[J]. 中国光学, 2011, 4(1): 86.

YANG Hong-dao, LI Xiao-hong, LI Guo-qiang, YUAN Chun-hua, QIU Rong. Surface morphology of silicon induced by 532 nm nanosecond laser under different ambient atmospheres[J]. Chinese Optics, 2011, 4(1): 86.

参考文献

[1] . Semiconductor surface damage produced by ruby lasers[J]. J. Appl. Phys., 1965, 36: 3688-3689.

[2] . Laser-induced periodic surface structure on solids: a universal phenonmenon[J]. Phys. Rev. Lett., 1982, 49(26): 1955-1958.

[3] . Sub-wavelength surface structures on silicon irradiated by femtosecond laser pulses at 1300 and 2100 nm wavelengths[J]. Appl. Surf. Sci., 2007, 253: 4970-4977.

[4] . . Laser-induced periodic surface structure. II. experiments on Ge, Si, Al, and brass[J]. Phys. Rev. B, 1983, 27(2): 1155-1172.

[5] . Laser-induced periodic surface structure. III. Fluence regimes,the role of feedback,and details of the induced topography in germanium[J]. Phys. Rev. B, 1984, 30(4): 2001-2015.

[6] 戴玉堂,徐刚,崔健磊,等.GaN基半导体材料的157 nm激光微刻蚀[J].中国激光,2009,36(12): 3138-3142.

    DAI Y T,XU G,CUI J L,et al.. Micro etching of GaN-based semiconductor materials using 157 nm laser[J]. Chinese J. Lasers,2009,36(12): 3138-3142.(in Chinese)

[7] 石岩,张宏,徐春鹰.铜基粉末冶金摩擦材料激光表面改性处理[J].中国激光,2009,36(5): 1246-1250.

    SHI Y,ZHANG H,XU CH Y. Laser surface modification of copper-based powder metallurgy friction materials[J]. Chinese J. Lasers,2009,36(5): 1246-1250.(in Chinese)

[8] 虞钢,王恒海,何秀丽.具有特定光强分布的激光表面硬化技术[J].中国激光,2009,36(2): 480-486.

    YU G,WANG H H,HE X L. Laser surface hardening using determined intensity distribution[J]. Chinese J. Lasers,2009,36(2): 1688-1691.(in Chinese)

[9] . . Microstructuring of silicon with femtosecond laser pulses[J]. Appl. Phys. Lett., 1998, 73(12): 1673-1675.

[10] . . Infrared absorption by conical silicon microstructures made in a variety of background gases using femtosecond-laser pulses[J]. J. Appl. Phys., 2003, 93(5): 2626-2629.

[11] 李平,王 煜,冯国进,等. 超短激光脉冲对硅表面微构造的研究[J].中国激光,2006,33(12): 1688-1691.

    LI P,WANG Y,FENG G J,et al.. Study of silicon micro-structuring using ultra-short laser pulses[J]. Chinese J. Lasers,2006,33(12): 1688-1691.(in Chinese)

[12] . . Infrared absorption by sulfur-doped silicon formed by femtosecond laser irradiation[J]. Appl. Phys. A, 2004, 79: 1635-1641.

[13] . . 3D periodic structures grown on silicon by radiation of a pulsed Nd∶YAG laser and their field emission properties[J]. Appl. Surf. Sci., 2006, 252: 4453-4456.

[14] . . Comparison of structure and properties of femtosecond and nanosecond laser structured silicon[J]. Appl. Phys. Lett., 2004, 84(11): 1850-1852.

[15] JIMNEZ-JARQUN J,HARO-PONIATOWSKI E,FERNNADEZ-GUASTI M,et al.. Laser induced micro-structuring of silicon under different atmospheres[J]. Radiat Eff. Defects Solids,2009,164(7-8): 443-451.

[16] . Silicon microcolumn arrays grown by nanosecond pulsed-excimer laser irradiation[J]. Appl. Phys. Lett., 1999, 74(16): 2322-2324.

[17] . Multiple photo excited SF6 interaction with silicon surfaces[J]. J. Chem. Phys., 1981, 74(2): 1453-1460.

[18] . SF6 decomposition and layer formation due to excimer laser photoablation of SiO2 surface at gas-solid system[J]. J. Phys. D: Appl. Phys., 2004, 37: 3402-3408.

[19] LOWNDES D H,FOWLKES J D,PEDRAZA A J. Early stages of pulsed-laser growth of silicon microcolumns and microcones in air and SF6[J]. Appl. Surf. Sci.,2000,154-155: 647-658.

[20] . . Formation of conical microstructures upon laser evaporation of solids[J]. Appl. Phys. A, 2001, 73: 177-181.

[21] . Defect capture under rapid solidication of the melt induced by the action of femtosecond laser pulses and formation of periodic surface structures on a semiconductor surface[J]. Appl. Phys. A, 2002, 74: 797-805.

[22] . Fundaments of laser-solid interactions[J]. Conference on Laser Solid Interactions and Laser Processing. AIP Conf. Proc.,New York, 1979, 50: 1-9.

[23] . Analysis of the radiation backscattered from a laser-produced plasma[J]. J. Appl. Phys., 1975, 46(7): 3096-3101.

杨宏道, 李晓红, 李国强, 袁春华, 邱荣. 不同气体环境下532 nm激光诱导硅表面形貌的研究[J]. 中国光学, 2011, 4(1): 86. YANG Hong-dao, LI Xiao-hong, LI Guo-qiang, YUAN Chun-hua, QIU Rong. Surface morphology of silicon induced by 532 nm nanosecond laser under different ambient atmospheres[J]. Chinese Optics, 2011, 4(1): 86.

本文已被 2 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!