不同气体环境下532 nm激光诱导硅表面形貌的研究
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杨宏道, 李晓红, 李国强, 袁春华, 邱荣. 不同气体环境下532 nm激光诱导硅表面形貌的研究[J]. 中国光学, 2011, 4(1): 86. YANG Hong-dao, LI Xiao-hong, LI Guo-qiang, YUAN Chun-hua, QIU Rong. Surface morphology of silicon induced by 532 nm nanosecond laser under different ambient atmospheres[J]. Chinese Optics, 2011, 4(1): 86.