光学学报, 2018, 38 (1): 0105001, 网络出版: 2018-01-22
基于改进型结构分解的极紫外光刻掩模衍射谱快速仿真方法
A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition
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张恒, 李思坤, 王向朝. 基于改进型结构分解的极紫外光刻掩模衍射谱快速仿真方法[J]. 光学学报, 2018, 38(1): 0105001. Zhang Heng, Li Sikun, Wang Xiangzhao. A Rapid Simulation Method for Diffraction Spectra of EUV Lithography Mask Based on Improved Structural Decomposition[J]. Acta Optica Sinica, 2018, 38(1): 0105001.