[1] 杨兵初,聂国政,李雪勇.类金刚石薄膜的电子结构及光学性质[J].中国有色金属学报,2006,16(6):990-992.(Yang B C,Nie G Z,Li X Y.Electron structure and optical property of diamond-like carbon.The Chinese Journal of Nonferrous Metals,2006,16(6):990-992)

[2] 李芳,刘东平,甲翠英.α:CH薄膜组成及结构[J].真空与低温,2001,7(2):85-88.(Li F,Liu D P,Jia C Y.Composition and structure of α:CH Films.Vacuum and Cryogenics,2001,7(2):85-88)

[3] Bandorf R,Luthje H,Staedler T.Influencing factors on microtribology of DLC films for MEMS and micro actuators[J].Diamond and Related Materials,2004,(13):1491-1493.

[4] Rajan N,Zorman C A,Mehregany M.Effect of MEMS compatible thin film hard coatings on the erosion resistance of silicon micromachined atomizers[J].Surface and Coatings Technology,1998,108-109:391-397.

[5] 吴振宇,汪家友,杨银堂,等.电子回旋共振等离子体的刻蚀技术[J].真空电子技术,2004,(2):61-63.(Wu Z Y,Wang J Y,Yang Y T,et al.Etching techniques by an ECR plasma source.Vacuum Electronics,2004,(2):61-63)

[6] 陈永生,汪建华.多晶硅的ECR等离子体刻蚀[J].武汉化工学报,2003,25(1):64-67.(Chen Y S,Wang J H.Poly Si etching by CF4 in electron cyclotron resonance plasma.Wuhan Inst Chem Tech,2003,25(1):64-67)

[7] Korzec D,Werner F,Brockhaus A,et al.Characterization of slot antenna microwave plasma cleaning[J].J Vac Sci Technol,1995,A13(4):2074-2085.

[8] 张继成,吴卫东,唐永建.微波等离子体在ICF制靶中的应用[J].强激光与粒子束,2004,16(8):1025-1028.(Zhang J C,Wu W D,Tang Y J.Application of microwave plasma technology to inertial confinement fusion target fabrication.High Power Laser and Particle Beams,2004,16(8):1025-1028)

[9] 张继成,唐永建,吴卫东.X射线反射法测量α:CH薄膜的密度和厚度[J].强激光与粒子束,2007,19(8):1317-1320.(Zhang J C,Tang Y J,Wu W D.X-ray reflectivity characterization of thickness and mass density of α:CH films.High Power Laser and Particle Beams,2007,19(8):1317-1320)

[10] 姚翔,沈荷生,丁桂甫,等.金刚石薄膜的反应离子刻蚀[J].微细加工技术,2000,3(3):23-28.(Yao X,Shen H S,Ding G F,et al.Reactive ion etching of diamond films.Microfabrication Technology,2000,3(3):23-28)