电解抛光法制备金属钨箔膜

研究了在硫酸甲醇体系中进行电解抛光制备状态方程(EOS)靶用钨薄膜。分析了钨的阳极极化曲线,对薄膜的表面形貌、晶粒取向、密度和厚度一致性进行了测试和分析,并制备出均方根粗糙度小于50 nm、厚度一致性好于99%、能够保持原材料密度的钨箔膜,满足激光驱动材料高温高压状态方程研究的标准靶材料的需求,证明电解抛光是制备低表面粗糙度、块材密度的EOS所用金属箔材的有效手段。

Abstract

The preparation of the tungsten foil for equation of state(EOS) target was studied by electropolishing in sulfuric acid-methanol. The anodic polarization curve of the tungsten foil was analyzed,and the surface topography,grain orientation,density and thickness uniformity were tested. The tungsten foil was prepared with high surface quality (RMS roughness less than 50 nm) and thickness uniformity beyond 99%,and could keep the density of raw materials. This foil could satisfy the requirement of laser driven materials for the research of high temperature and pressure EOS. Thus electropolishing is a significant method for preparating the foil which can fulfill the requirement of EOS target.

参考文献

[1] 顾援,傅思祖,黄秀光,等.激光驱动高压下材料状态方程实验研究进展[J].物理,2007,36(6):465-470.(Gu Yuan,Fu Sizu,Huang Xiu-guang,et al. Equations of state under extremely high pressure obtained by high power laser experiments. Physics,2007,36(6):465-470)

[2] Yun J H,Park S K. Theoretical study of step coverage and comparison with experimental results from low pressure chemical vapor deposition process of tungsten film[J]. Appl Phys,1995,34:3216-3221.

[3] Nobuhiko S,Seigo A,Sadao A. Properties of tungsten film deposited on GaAs by RF magnetron sputtering[J]. Electrochemical Society,1985,132(9):2245-2250.

[4] 张素银,杜凯,邢丕峰,等.钛膜的电解抛光技术研究[J].强激光与粒子束,2007,19(9):1479-1482.(Zhang Suyin,Du Kai,Xing Pifeng,et al. Investigation on electropolishing of Ti film. High Power Laser and Particle Beams,2007,19(9):1479-1482)

[5] 谢格列夫.金属电抛光和化学抛光[M].北京:科学出版社,1961.(ЩИГДЕВ П В. Electropolishing and chemical polishing of metals. Beijing: Science Press,1961)

[6] 宋萍,邢丕峰,谌家军,等.硫酸-甲醇体系钨电解抛光的可行性研究[J].电镀与涂饰,2009,28(3):27-30.(Song Ping,Xing Pifeng,Chen Jiajun,et al. Progress of tungsten foil fabrication. Electroplating and Finishing,2009,28(3):27-30)

[7] 缪卫东.钛镍形状记忆合金电化学抛光研究[D].北京:北京有色金属研究总院,2004:25-31.(Miao Weidong. Study on nitinol electropolishing. Beijing: Beijing General Research Institute for Non-ferrous Metals,2004:25-31)

[8] Landolt D,Chauvy P F,Zinger O. Electrochemical micromaching,polishing and surface structuring of metals:fundamental aspects and new developments[J]. Electrochimica Acta,2003,48:3185-3192.

[9] Wu A T,John M,Philips L,et al. Smooth Nb surfaces fabricated by buffered electropolishing[J]. Applied Surface Science,2007,253:3041-3052.

[10] 杨于兴,胡赓祥.薄膜X射线应力分析技术的研究[J].上海交通大学学报,1994,28(6):52-58.(Yang Yuxing,Hu Gengxiang. The study of thin film X-ray stress analysis. Journal of Shanghai Jiaotong Univerity,1994,28(6):52-58)

[11] Capello E. Residual stresses in turning part I: Influence of process parameters[J]. Joural of Materials Processing Technology,2005,160:221-228

宋萍, 邢丕峰, 谌家军, 李朝阳, 谢军, 郑凤成. 电解抛光法制备金属钨箔膜[J]. 强激光与粒子束, 2010, 22(2): 311. Song Ping, Xing Pifeng, Chen Jiajun, Li Chaoyang, Xie Jun, Zheng Fengcheng. Preparation of tungsten foil by electropolishing[J]. High Power Laser and Particle Beams, 2010, 22(2): 311.

电解抛光法制备金属钨箔膜

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