[1] Roadmap I. International technology roadmap for semiconductors[J]. Executive Summary. Semiconductor Industry Association, 2009.

[2] Erdmann A, Farkas R, Fuhner T, et al. Mask and source optimization for lithographic imaging systems[C]. SPIE, 2003, 5182: 88-102.

[3] Erdmann A, Fuehner T, Schnattinger T, et al. Towards automatic mask and source optimization for optical lithography[C]. SPIE, 2004, 2004: 647.

[4] Fuhner T, Erdmann A. Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm[C]. SPIE, 2005, 5754: 415-426.

[5] Fuehner T, Erdmann A, Schnattinger T. Genetic algorithms for geometry optimization in lithographic imaging systems[C]. SPIE, 2004, 5558: 29-40.

[6] Yang C, Li S, Wang X. Efficient source mask optimization using multi pole source representation[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 2014, 13(4): 043001.

[7] Yang C, Wang X, Li S, et al. Source mask optimization using real-coded genetic algorithm[C]. SPIE, 2013, 8683: 86831T.

[8] 杨朝兴, 李思坤, 王向朝. 基于动态适应度函数的光源掩模优化方法[J]. 光学学报, 2016, 36(1): 0111006.

    Yang Chaoxing, Li Sikun, Wang Xiangzhao. Source mask optimization based on dynamic fitness function[J]. Acta Optica Sinica, 2016, 36(1): 0111006.

[9] Li S, Wang X, Bu Y. Robust pixel-based source and mask optimization for inverse lithography[J]. Optics & Laser Technology, 2013, 45: 285-293.

[10] Jia N, Lam E Y. Pixelated source mask optimization for process robustness in optical lithography[J]. Opt Express, 2011, 19(20): 19384-19398.

[11] Ma X, Arce G R. Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography[J]. Opt Express, 2009, 17(7): 5783-5793.

[12] Wong A K K. Optical imaging in projection microlithography[C]. SPIE, 2005.

[13] Fuhner T, Evanschitzky P, Erdmann A. Mutual source, mask, and projector pupil optimization[C]. SPIE, 2012, 8326: 83260I.

[14] 郭立萍, 黄惠杰, 王向朝. 光学光刻中的离轴照明技术[J]. 激光杂志, 2005, 26(1): 23-25.

    Guo Liping, Huang Huijie, Wang Xiangzhao. Off-axis illumination for optical lithography[J]. Laser Journal, 2005, 26(1): 23-25.

[15] Chang J H, Chen C C, Melvin III L S. Hierarchical kernel generation for SMO application[C]. SPIE, 2011, 7973: 797323.

[16] 李兆泽, 李思坤, 王向朝. 基于随机并行梯度速降算法的光刻机光源与掩模联合优化方法[J]. 光学学报, 2014, 34(9): 0911002.

    Li Zhaoze, Li Sikun, Wang Xiangzhao. Source and mask optimization using stochastic parallel gradient descent algorithm in optical lithography[J]. Acta Optica Sinica, 2014, 34(9): 0911002.

[17] Peng Y, Zhang J, Wang Y, et al. Gradient-based source and mask optimization in optical lithography[J]. IEEE Transactions on Image Processing, 2011, 20(10): 2856-286.

[18] Shen Y, Jia N, Wong N, et al. Robust level-set-based inverse lithography[J]. Opt Express, 2011, 19(6): 5511-5521.

[19] Pati Y, Ghazanfarian A A, Pease R F. Exploiting structure in fast aerial image computation for integrated circuit patterns[J]. IEEE Transactions on, Semiconductor Manufacturing, 1997, 10(1): 62-74.

[20] 邢莎莎, 冉英华, 江海波, 等. 基于微反射镜阵列的光刻照明模式变换系统设计[J]. 光学学报, 2015, 35(11): 1111002.

    Xing Shasha, Ran Yinghua, Jiang Haibo, et al. Illumination mode conversion system design based on micromirror array in lithography[J]. Acta Optica Sinica, 2015, 35(11): 1111002.

[21] Borodovskya Y, Chengb W H, Schenkera R, et al. Pixelated phase mask as novel lithography RET[C]. SPIE, 2008, 6924: 69240E.