激光与光电子学进展, 2017, 54 (1): 013102, 网络出版: 2017-01-17
热退火处理对氧化铟锡薄膜光电特性的影响 
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Influence of Thermal Annealing on Photoelectrical Properties of Indium-Tin Oxide Thin Films
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肖和平, 郭冠军, 马祥柱, 张双翔. 热退火处理对氧化铟锡薄膜光电特性的影响[J]. 激光与光电子学进展, 2017, 54(1): 013102.
Xiao Heping, Guo Guanjun, Ma Xiangzhu, Zhang Shuangxiang. Influence of Thermal Annealing on Photoelectrical Properties of Indium-Tin Oxide Thin Films[J]. Laser & Optoelectronics Progress, 2017, 54(1): 013102.
肖和平, 郭冠军, 马祥柱, 张双翔. 热退火处理对氧化铟锡薄膜光电特性的影响[J]. 激光与光电子学进展, 2017, 54(1): 013102. Xiao Heping, Guo Guanjun, Ma Xiangzhu, Zhang Shuangxiang. Influence of Thermal Annealing on Photoelectrical Properties of Indium-Tin Oxide Thin Films[J]. Laser & Optoelectronics Progress, 2017, 54(1): 013102.
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