激光与光电子学进展, 2017, 54 (1): 013102, 网络出版: 2017-01-17
热退火处理对氧化铟锡薄膜光电特性的影响 下载: 1506次
Influence of Thermal Annealing on Photoelectrical Properties of Indium-Tin Oxide Thin Films
补充材料
肖和平, 郭冠军, 马祥柱, 张双翔. 热退火处理对氧化铟锡薄膜光电特性的影响[J]. 激光与光电子学进展, 2017, 54(1): 013102. Xiao Heping, Guo Guanjun, Ma Xiangzhu, Zhang Shuangxiang. Influence of Thermal Annealing on Photoelectrical Properties of Indium-Tin Oxide Thin Films[J]. Laser & Optoelectronics Progress, 2017, 54(1): 013102.