光学学报, 2007, 27 (3): 494, 网络出版: 2007-03-15  

刻蚀改变InGaN/AlGaN应变多量子阱发光特性

Photoluminescence of InGaN/AlGaN Strained Multiple Quantum Wells Influenced by Dry Etching
作者单位
1 中国科学院上海微系统与信息技术研究所信息功能材料国家重点实验室, 上海 200050
2 中国科学院研究生院, 北京 100039
引用该论文

曹萌, 吴惠桢, 劳燕锋, 刘成, 谢正生. 刻蚀改变InGaN/AlGaN应变多量子阱发光特性[J]. 光学学报, 2007, 27(3): 494.

曹萌, 吴惠桢, 劳燕锋, 刘成, 谢正生. Photoluminescence of InGaN/AlGaN Strained Multiple Quantum Wells Influenced by Dry Etching[J]. Acta Optica Sinica, 2007, 27(3): 494.

参考文献

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曹萌, 吴惠桢, 劳燕锋, 刘成, 谢正生. 刻蚀改变InGaN/AlGaN应变多量子阱发光特性[J]. 光学学报, 2007, 27(3): 494. 曹萌, 吴惠桢, 劳燕锋, 刘成, 谢正生. Photoluminescence of InGaN/AlGaN Strained Multiple Quantum Wells Influenced by Dry Etching[J]. Acta Optica Sinica, 2007, 27(3): 494.

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