光学学报, 2005, 25 (2): 246, 网络出版: 2006-05-22   

利用傅里叶模方法分析厚层光刻胶内衍射光场

Analysis of Diffractive Image Field in Thick Film Photo-Resist by Using Fourier Modal Method
作者单位
四川大学物理科学与技术学院, 成都 610064
引用该论文

唐雄贵, 郭永康, 杜惊雷, 刘世杰, 高峰, 高福华. 利用傅里叶模方法分析厚层光刻胶内衍射光场[J]. 光学学报, 2005, 25(2): 246.

唐雄贵, 郭永康, 杜惊雷, 刘世杰, 高峰, 高福华. Analysis of Diffractive Image Field in Thick Film Photo-Resist by Using Fourier Modal Method[J]. Acta Optica Sinica, 2005, 25(2): 246.

参考文献

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唐雄贵, 郭永康, 杜惊雷, 刘世杰, 高峰, 高福华. 利用傅里叶模方法分析厚层光刻胶内衍射光场[J]. 光学学报, 2005, 25(2): 246. 唐雄贵, 郭永康, 杜惊雷, 刘世杰, 高峰, 高福华. Analysis of Diffractive Image Field in Thick Film Photo-Resist by Using Fourier Modal Method[J]. Acta Optica Sinica, 2005, 25(2): 246.

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