光学学报, 2005, 25 (2): 246, 网络出版: 2006-05-22   

利用傅里叶模方法分析厚层光刻胶内衍射光场

Analysis of Diffractive Image Field in Thick Film Photo-Resist by Using Fourier Modal Method
作者单位
四川大学物理科学与技术学院, 成都 610064
摘要
建立了描述厚层光刻胶内衍射光场形成过程的物理模型,并利用傅里叶模方法模拟计算和分析了其内部衍射光场分布。该方法考虑了其界面反射、透射及光刻胶复折射率在空间上的缓慢变化对衍射光场的影响,采用该方法模拟光刻胶内衍射光场具有数值计算结果准确、计算速度快的优点。对厚层光刻胶折射率在几种特殊分布情况下衍射光场分布的数值模拟表明,衍射光场与其复折射率的空间分布有关。由于厚层光刻胶折射率在空间上呈缓慢变化的特点,为降低其数值计算量和编程难度,可以将厚层光刻胶近似为折射率随曝光时间变化的光栅。
Abstract
According to the lithographic characteristics of thick film photo-resist, a novel physical model is established. Then Fourier model method, mostly applied to study the diffractive properties of gratings is adopted to analyze the diffractive image field in thick film photo-resist. The factors such as reflection and transmission at the interface, complex diffraction in the photo-resist, are taken into account. This method has higher computing precision and smaller computation cost. Numerical simulation results show that the distribution of diffractive image field is relevant to that of complex refractive index. As a result, it is reasonable to regard the thick film photo-resist as grating with variable refractive index during exposure process.
参考文献

[1] F. H. Dill. Optical lithography[J]. IEEE Trans. Electron. Devices, 1975, ED-22(7)

[2] W. W. Flack, G. Newman, D. Bernard et al.. Advanced simulation techniques for thick photo-resist lithography[C]. Proc. SPIE, 1997, 3049: 789~804

[3] Xiao Xiao, Du Jinglei, Guo Yongkang et al.. Study on new method of reducing standing wave effects in lithography[J]. Microfabrication Technology, 2002, (4):36~44 (in Chinese)
肖啸, 杜惊雷, 郭永康 等. 减小光刻中驻波效应的新方法研究[J]. 微细加工技术, 2002, (4): 36~44

[4] R. Gordon, C. A. Mack. Lithography simulation employing rigorous solution to Maxwell′s equations[C]. Proc. SPIE, 1998, 3334: 176~196

[5] Thomas Vincent Pistor. Electromagnetic simulation and modeling with application in lithography[D] University of California, Berkeley, 2001

[6] . Reformulation of Fourier modal method for surface-relief gratings made with anisotropic materials[J]. J. Mod. Opt., 1998, 45(7): 1313-1334.

[7] . Multilayer modal method for diffraction gratings of arbitrary profile, depth and permittivity[J]. J. Opt. Soc. Am. (A), 1993, 10(12): 2581-2591.

[8] Tang Xionggui, Fu Kexiang, Wang Zhiheng et al.. Analysis of rigorous modal theory for arbitrary dielectric gratings made with anisotropic materials[J]. Acta Optic Sinica, 2002, 22(7): 774~779 (in Chinese)
唐雄贵, 傅克祥, 王植恒 等. 任意各向异性介质光栅的严格模式理论分析[J]. 光学学报, 2002, 22(7): 774~779 (in Chinese)

[9] Zeng Yangsu, Tang Xionggui, Fu Kexiang et al.. Vector diffractive analysis for two-dimensional relief gratings made with anisotropic medium[J]. Acta Optic Sinica, 2003, 23(1): 95~100 (in Chinese)
曾阳素, 唐雄贵, 傅克祥 等. 二维各向异性浮雕型光栅的矢量衍射分析[J]. 光学学报, 2003, 23(1): 95~100

[10] Fu Kexiang, Wang Zhiheng, Zhang Jing et al.. Fast processing of Fourier modal method for perpendicularly crossed surface relief binary periodic grating[J]. Acta Optic Sinica, 2001, 21(2): 236~241 (in Chinese)
傅克祥, 王植恒, 张靖 等. 对正交浮雕光栅傅里叶模方法的快速实现[J]. 光学学报, 2001, 21(2): 236~241

[11] M. Born, E. Wolf. Principles of Optics (7th Edition)[M]. Cambridge: Cambridge University Press, 1999. 703~716

[12] . Use of Fourier series in the analysis of discontinuous periodic structures[J]. J. Opt. Soc. Am. (A), 1996, 13(9): 1870-1876.

[13] B. Guizal, D. Barchiesi, D. Felbacq. Electromagnetic beam diffraction by a finite lamellar structure: an aperiodic coupled-wave method. J. Opt. Soc. Am. (A), 2003, 20(12): 2274~2280

唐雄贵, 郭永康, 杜惊雷, 刘世杰, 高峰, 高福华. 利用傅里叶模方法分析厚层光刻胶内衍射光场[J]. 光学学报, 2005, 25(2): 246. 唐雄贵, 郭永康, 杜惊雷, 刘世杰, 高峰, 高福华. Analysis of Diffractive Image Field in Thick Film Photo-Resist by Using Fourier Modal Method[J]. Acta Optica Sinica, 2005, 25(2): 246.

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