利用傅里叶模方法分析厚层光刻胶内衍射光场
[1] F. H. Dill. Optical lithography[J]. IEEE Trans. Electron. Devices, 1975, ED-22(7)
[2] W. W. Flack, G. Newman, D. Bernard et al.. Advanced simulation techniques for thick photo-resist lithography[C]. Proc. SPIE, 1997, 3049: 789~804
[3] Xiao Xiao, Du Jinglei, Guo Yongkang et al.. Study on new method of reducing standing wave effects in lithography[J]. Microfabrication Technology, 2002, (4):36~44 (in Chinese)
肖啸, 杜惊雷, 郭永康 等. 减小光刻中驻波效应的新方法研究[J]. 微细加工技术, 2002, (4): 36~44
[4] R. Gordon, C. A. Mack. Lithography simulation employing rigorous solution to Maxwell′s equations[C]. Proc. SPIE, 1998, 3334: 176~196
[5] Thomas Vincent Pistor. Electromagnetic simulation and modeling with application in lithography[D] University of California, Berkeley, 2001
[6] . Reformulation of Fourier modal method for surface-relief gratings made with anisotropic materials[J]. J. Mod. Opt., 1998, 45(7): 1313-1334.
[7] . Multilayer modal method for diffraction gratings of arbitrary profile, depth and permittivity[J]. J. Opt. Soc. Am. (A), 1993, 10(12): 2581-2591.
[11] M. Born, E. Wolf. Principles of Optics (7th Edition)[M]. Cambridge: Cambridge University Press, 1999. 703~716
[12] . Use of Fourier series in the analysis of discontinuous periodic structures[J]. J. Opt. Soc. Am. (A), 1996, 13(9): 1870-1876.
[13] B. Guizal, D. Barchiesi, D. Felbacq. Electromagnetic beam diffraction by a finite lamellar structure: an aperiodic coupled-wave method. J. Opt. Soc. Am. (A), 2003, 20(12): 2274~2280
唐雄贵, 郭永康, 杜惊雷, 刘世杰, 高峰, 高福华. 利用傅里叶模方法分析厚层光刻胶内衍射光场[J]. 光学学报, 2005, 25(2): 246. 唐雄贵, 郭永康, 杜惊雷, 刘世杰, 高峰, 高福华. Analysis of Diffractive Image Field in Thick Film Photo-Resist by Using Fourier Modal Method[J]. Acta Optica Sinica, 2005, 25(2): 246.