基于离子束溅射大口径光学元件平坦化层均匀性研究
[1] 才玺坤,张立超,时光,等.离子束溅射制备低应力深紫外光学薄膜[J].中国光学,2016,9(6): 649-655.
[2] BUNDESMANN C, LAUTENSCHLGER T, THELANDER E, et al. Reactive Ar ion beam sputter deposition of TiO2, films: influence of process parameters on film properties[J]. Nuclear Instruments & Methods in Physics Research, 2017, 395: 17-23.
[3] HUANG Jun-jun, GUI Cheng-mei, DING Ming, et al. Effect of assisted-ion-beam gases on the structure of amorphous silicon thin films prepared by ion-beam-assisted sputtering[J]. Materials Science Forum, 2016, 852: 1102-1107.
[4] KIONTKE S, ALLENSTEIN F. Ion-beam figuring (IBF) for high-precision optics becomes affordable[C]. SPIE, 2010, 7786: 77860F.
[5] ARKWRIGHT J, BURKE J, GROSS M. A deterministic optical figure correction technique that preserves precision-polished surfacequality[J]. Optics Express, 2008, 16(18): 13901-13907.
[6] 唐瓦.离子束抛光大口径非球面去除模型与工艺研究[D].长春: 中国科学院长春光学精密机械与物理研究所,2016.
TANG Wa. Research on removal model and technology for ion beam figuring large aspherical mirror[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2016.
[7] 付秀华,杨永亮,刘国军,等.大面积头罩上类金刚石薄膜均匀性研究[J].红外与激光工程,2013,42(1): 181-184.
FU Xiu-hua, YANG Yong-liang, LIU Guo-jun, et al. Study on the uniformity of diamond-like carbon films on a large hood[J].Infrared and Laser Engineering,2013, 42(1): 181-184.
[8] ORTIZ T, CONDE C, KHAN T M, et al. Thickness uniformity and optical/structural evaluation of RF sputtered ZnO thin films for solar cell and other device applications[J]. Applied Physics A, 2017, 123(4): 280-286.
[9] 谌贵阳,解旭辉,周林,等.光学加工射频离子源的去除函数与稳定性研究[J].航空精密制造技术,2016,52(5): 19-22.
CHEN Gui-yang, XIE Xu-hui, ZHOU Lin, et al. Study on the removal function and stability of radiofrequency ion source in optical processing[J]. Aeronautical Precision Manufacturing Technology, 2016, 52(5): 19-22.
[10] 赵淼,雷光玖,李明,等.射频离子源束流特性分析[J].核聚变与等离子体物理,2018,38(2): 152-157.
ZHAO Miao, LEI Guang-jiu, LI Ming, et al. Analysis of beam characteristics of the radio frequency ion source[J]. Nuclear Fusion and Plasma Physics, 2018, 38(2): 152-157.
[11] GUO Cheng-jun, PEI Ning, WANG Da-sen, et al. The technique of ion beam etching polishing[J]. Applied Mechanics & Materials, 2013, 395-396: 1066-1070.
[12] 孟萌,武文革,张勇,等.基于响应曲面法的溅射沉积薄膜工艺参数优化[J].工具技术,2017,51(7): 24-27.
MENG Meng ,WU Wen-ge, ZHANG Yong, et al. Optimization of process parameters of sputtered thin films based on response surface methodology[J]. Tool Technology, 2017, 51(7): 24-27.
[13] 李凌辉,熊胜明,申林,等.离子束溅射淀积光学薄膜的膜厚均匀性实验[J].光电工程,2004,31(s1): 67-69.
LI Ling-hui, XIONG Sheng-ming, SHEN Lin, et al. Experiment of film thickness uniformity by ion beam sputtering deposition of optical thin films[J]. Optoelectronic Engineering, 2004, 31(s1): 67-69.
[14] ORTIZ T, CONDE C, KHAN T M, et al. Thickness uniformity and optical/structural evaluation of RF sputtered ZnO thin films for solar cell and other device applications[J]. Applied Physics A, 2017, 123(4): 280-286.
[15] DHAWAN R, RAI S, LODHA G S. Effect of ion beam energy on density, roughness & uniformity of Co film deposited using ion beam sputteringsystem[C]. American Institute of Physics, 2012: 691-692.
冯时, 付秀华, 王大森, 李晓静, 聂凤明, 张旭. 基于离子束溅射大口径光学元件平坦化层均匀性研究[J]. 光子学报, 2019, 48(1): 0131002. FENG Shi, FU Xiu-hua, WANG Da-sen, LI Xiao-jing, NIE Feng-ming, ZHANG Xu. Study on Planarization Layer Uniformity of Large-aperture Optical Elements Based on Ion Beam Sputtering[J]. ACTA PHOTONICA SINICA, 2019, 48(1): 0131002.