激光与光电子学进展, 2020, 57 (3): 032202, 网络出版: 2020-02-17   

基于无掩模光刻的高精度ITO电极湿法刻蚀工艺研究 下载: 1591次

High-Precision ITO Electrode Wet Etching Technology Based on Maskless Lithography
作者单位
1 大连海事大学轮机工程学院, 辽宁 大连 116026
2 广东海洋大学海洋工程学院, 广东 湛江 524088
引用该论文

殷艺, 刘志坚, 王赛杰, 武森, 严志军, 潘新祥. 基于无掩模光刻的高精度ITO电极湿法刻蚀工艺研究[J]. 激光与光电子学进展, 2020, 57(3): 032202.

Yi Yin, Zhijian Liu, Saijie Wang, Sen Wu, Zhijun Yan, Xinxiang Pan. High-Precision ITO Electrode Wet Etching Technology Based on Maskless Lithography[J]. Laser & Optoelectronics Progress, 2020, 57(3): 032202.

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殷艺, 刘志坚, 王赛杰, 武森, 严志军, 潘新祥. 基于无掩模光刻的高精度ITO电极湿法刻蚀工艺研究[J]. 激光与光电子学进展, 2020, 57(3): 032202. Yi Yin, Zhijian Liu, Saijie Wang, Sen Wu, Zhijun Yan, Xinxiang Pan. High-Precision ITO Electrode Wet Etching Technology Based on Maskless Lithography[J]. Laser & Optoelectronics Progress, 2020, 57(3): 032202.

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