极紫外波段变栅距光栅刻槽密度变化及光谱分辨能力分析

李文昊; 姜岩秀; 吴娜; 张桐; 王鹍

doi:doi:10.3788/fgxb20153609.1094

发光学报, 2015, 36 (9): 1094, 网络出版: 2015-10-22

极紫外波段变栅距光栅刻槽密度变化及光谱分辨能力分析

Analysis for Groove Density and Spectral Resolution of Varied-line-space Gratings in EUV Spectrum

论文大纲

李文昊 ^*姜岩秀吴娜张桐王鹍

作者单位

中国科学院长春光学精密机械与物理研究所, 吉林长春130033

变栅距光栅球面波刻槽密度光谱分辨能力 varied-line-space grating spherical wavefront groove density spectral resolution

摘要

针对应用于50~150 nm波段的变栅距光栅, 采用球面波曝光系统进行优化设计, 分析了不同宽度光栅的刻槽密度变化和光谱分辨能力。理论分析结果表明, 光栅宽度为4 mm时, 理论分辨能力高于14 000; 光栅宽度为10 mm时, 理论分辨能力约为9 000; 光栅宽度为30 mm时, 理论分辨能力急剧下降, 约为3 000。光栅的宽度越大, 其刻槽弯曲程度就越大, 光栅的光谱分辨能力就越低, 因此球面波曝光系统只适合制作宽度较小的变栅距光栅。

Abstract

For the varied line-space (VLS) grating used in the region of 50-150 nm, the spherical wave exposure system was used for the optimization design, and the groove density and spectra resolution of the different width grating were analyzed. The theory resolution ability is higher than 14 000 when the grating width is 4 mm in the use of wavelength range, about 9 000 when the grating width is 10 mm, and about 3 000 when the grating width is 30 mm, respectively. The bigger the grating width is, the bigger the bending degree of groove is, and the lower the spectral resolution ability is. Therefore, spherical wave exposure system is only suitable for making the VLS grating with smaller width.

参考文献

[1] Duke P H. Synchrotron Radiation ［M］. Oxford: Oxford University Press, 2000.

[2] Ma D L. Introduction to Synchrotron Radiation Applications ［M］. Shanghai: Fudan University Press, 2001 (in Chinese).

[3] Tong Y J. Study of Precision Measurements of Monk-Gillieson Soft X-ray Grating Monochromator and Offner Inaging Spectrometer ［D］. Shanghai: Shanghai Institute of Applied Physics, Chinese Academy of Science, 2010 (in Chinese).

[4] Hofmann A. The Physics of Synchrotron Radiation ［M］. Cambridge: Cambridge University Press, 2004.

[5] Li C Y. Variable-line-spacing Grating Monochromators Design and Key Techniques ［D］. Hefei: University of Science and Technology of China, 2014 (in Chinese).

[6] Francis P, Lagarde B, Idir M. A high resolution soft X-ray monochromator focused by the holographic effect of a VLS grating ［J］. AIP Conf. Proc., 2006, 879:655-658.

[7] Liu Z K, Liu Y, Qiu K Q, et al. Design and fabrication of soft X-ray double frequency grating ［J］. Opt. Precision Eng.(光学精密工程), 2013, 21(7):1780-1785 (in Chinese).

[8] Li C Y, Zhu J F, Wang Q P. Design of a varied-line-spacing plane grating monochromator at NSRL for surface physics ［J］. J. Phys.: Conf. Ser., 2015, 45(16):162008-1-6.

[9] Namioka T, Koike M. Aspheric wave-front recording optics for holographic gratings ［J］. Appl. Opt., 1995, 34(13):2180-2186.

[10] Jiang Y X, Han J, Li W H, et al. Characteristic analysis for different beamsplitters of the plane holographic grating lithography system ［J］. Chin. Opt. (中国光学), 2015, 8(2):241-247 (in Chinese)

[11] Koike M, Yamazaki T, Harada Y. Design of holographic gratings recorded with aspheric wave-front recording optics for soft X-ray flat-field spectrographs ［J］. J. Electron Spectros. Related Phenom., 1999, 101:913-918.

[12] Ling Q, Wu G, Liu B, et al. Varied line spacing plane holographic grating recorded by using uniform line spacing plane gratings ［J］. Appl. Opt., 2005, 45(21):5059-5065.

[13] Jiang Y X, Bayanheshig, Yang S, et al. Design of a varied-line-space plane grating in EUV spectrum ［J］. Acta Optica Sinica (光学学报), 2015, 36(1):45-55 (in Chinese).

[14] Namioka T. Theory of the concave grating Ⅱ. Application of the theory to the off-plane eagle mounting in a vacuum spectrograph ［J］. J. Opt. Soc. Am., 1959, 49(5):460-465.

[15] Du X W. Measurement of Groove Density 2D Distribution of Concave VLS Grating and Construction of A Soft X-ray Flat Field Spectrograph ［D］. Hefei: University of Science and Technology of China, 2013 (in Chinese).

李文昊, 姜岩秀, 吴娜, 张桐, 王鹍. 极紫外波段变栅距光栅刻槽密度变化及光谱分辨能力分析[J]. 发光学报, 2015, 36(9): 1094. LI Wen-hao, JIANG Yan-xiu, WU Na, ZHANG Tong, WANG Kun. Analysis for Groove Density and Spectral Resolution of Varied-line-space Gratings in EUV Spectrum[J]. Chinese Journal of Luminescence, 2015, 36(9): 1094.

极紫外波段变栅距光栅刻槽密度变化及光谱分辨能力分析

关于本站 Cookie 的使用提示

全站搜索

极紫外波段变栅距光栅刻槽密度变化及光谱分辨能力分析

相关论文

相关资讯

关于本站 Cookie 的使用提示

全站搜索