中国激光, 2017, 44 (9): 0902004, 网络出版: 2017-09-07
248 nm准分子激光刻蚀的无裂损石英玻璃表面微通道 
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Crack-Free Silica Glass Surface Micro-Grooves Etched by 248 nm Excimer Lasers
图 & 表
图 1. 248 nm准分子激光加工玻璃装置示意图
Fig. 1. Schematic of setup for glass processed by 248 nm excimer laser
图 2. 实验主要装置。(a)准分子激光器;(b)加工平台
Fig. 2. Main experimental setups. (a) Excimer laser; (b) processing platform
图 3. (a)~(d)不同激光能量密度下的刻蚀石英玻璃表面后的光学显微镜照片;(e)激光对石英玻璃的刻蚀率随激光能量密度的变化情况
Fig. 3. (a)-(d) Optical microscope photographs of silicon glass etched under different laser energy densities; (e) laser etching rate for silica glass versus laser energy density
图 4. 静态刻蚀微槽的底部形貌在(a) X及(b) Y方向上的变化趋势
Fig. 4. Changing trends of bottom morphology of statically etched micro-groove in X and Y directions
图 5. 石英玻璃刻蚀的光学显微镜照片。(a)静态刻蚀方槽的周边沉积物的形貌;(b)直写刻蚀微通道沉积物的形貌
Fig. 5. Optical microscope photographs of etched silica glass. (a) Morphology of sediment surrounding statically etched groove; (b) morphology of sediment of direct-writing etched micro-groove
图 6. 石英玻璃刻蚀后沉积物的局部SEM照片。(a)散落的微颗粒;(b)熔融的附着物
Fig. 6. Local SEM photos for sediment of etched silica glass. (a) Scattered particles; (b) fused attachments
图 7. 不同激光脉冲个数作用下微槽底部的形貌。(a) 20个脉冲;(b) 40个脉冲;(c) 80个脉冲;(d) 120个脉冲
Fig. 7. Bottom morphologies of micro-grooves under different numbers of laser pulses. (a) 20 pulses; (b) 40 pulses; (c) 80 pulses; (d) 120 pulses
图 8. 石英玻璃表面有缺陷时的裂损情况。(a)原始表面; (b)刻蚀后的裂损情况1; (c)刻蚀后的裂损情况2
Fig. 8. Crack conditions of silica glass surface with defect. (a) Original surface; (b) crack condition 1 after etching; (c) crack condition 2 after etching
图 9. 不同激光重复频率下石英玻璃微通道的形貌。(a) 6 Hz; (b) 10 Hz; (c) 20 Hz; (d) 50 Hz
Fig. 9. Morphologies of silicon glass micro-grooves under different laser repetition frequencies. (a) 6 Hz; (b) 10 Hz; (c) 20 Hz; (d) 50 Hz
图 10. (a)~(c)当重复频率为20 Hz时,不同扫描次数下的微通道光学显微镜照片;(d)微通道深度随扫描次数的变化
Fig. 10. (a)-(c) Optical microscope photos of micro-grooves under different scanning times at repetition frequency of 20 Hz; (d) micro-groove depth versus scanning times
图 11. 当重复频率为50 Hz、扫描次数为(a)1和(b)2时,圆形微通道的光学显微镜照片;(c)当重复频率为30 Hz、扫描次数为3时,圆形微通道的光学显微镜照片
Fig. 11. Optical microscope photos of circular micro-grooves when scanning times is (a) 1 and (b) 2 at repetition frequency of 50 Hz; (c) optical microscope photo of circular micro-groove when scanning times is 3 at repetition frequency of 30 Hz
图 12. 当激光能量密度为23.5 J·cm-2、扫描速率为6 mm·min-1时,无裂损石英玻璃表面微通道的光学显微镜照片。(a)整体结构;(b)圆弧段(激光重复频率50 Hz);(c)直线段(激光重复频率40 Hz)
Fig. 12. Optical microscope photos of crack-free silica glass micro-grooves when laser energy density is 23.5 J·cm-2 and scanning speed is 6 mm·min-1. (a) Overall structure; (b) circular arc section (laser repetition frequency is 50 Hz); (c) straight line section (laser repetition frequency is 40 Hz)
表 1石英玻璃刻蚀前后的化学成分含量(原子数分数,%)
Table1. Chemical compositions of silica glass before and after etching (atomic fraction, %)
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杨桂栓, 陈涛, 陈虹. 248 nm准分子激光刻蚀的无裂损石英玻璃表面微通道[J]. 中国激光, 2017, 44(9): 0902004. Yang Guishuan, Chen Tao, Chen Hong. Crack-Free Silica Glass Surface Micro-Grooves Etched by 248 nm Excimer Lasers[J]. Chinese Journal of Lasers, 2017, 44(9): 0902004.
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