用反差确定电子束曝光剂量与刻蚀深度的关系
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卢文娟, 张玉林, 孔祥东, 郝慧娟. 用反差确定电子束曝光剂量与刻蚀深度的关系[J]. 强激光与粒子束, 2007, 19(8): 1377. 卢文娟, 张玉林, 孔祥东, 郝慧娟. Determining relationship between electron-beam dose and etching depth by empirical formula of contrast[J]. High Power Laser and Particle Beams, 2007, 19(8): 1377.