中国激光, 2013, 40 (11): 1107002, 网络出版: 2013-10-24   

辉光放电辅助脉冲激光沉积CNx薄膜的价键结构及机械性能

Valence Bond Structure and Mechanical Properties of CNx Films Prepared by Glow Discharge Assisted Pulsed Laser Deposition
作者单位
浙江工业大学机械工程学院, 浙江 杭州 310014
摘要
采用直流辉光放电辅助脉冲激光沉积(PLD)法,以不同的激光通量在单晶硅基底上沉积CNx薄膜。利用扫描电镜(SEM)、拉曼光谱、X射线衍射(XRD)谱、X射线光电子谱(XPS)、纳米压入仪和球盘式微型摩擦磨损试验仪对薄膜的成分、微观结构、表面形貌、力学及摩擦学性能进行了系统分析。结果表明:所有薄膜处于非晶状态。当激光通量从5.1 J/cm2提升至7.5 J/cm2时,薄膜的含氮原子数分数由27.7%上升至34.1%;膜中sp3C—N键和sp2C—N键的面积百分数上升,sp3C—C键的面积百分数降低, C原子sp3杂化程度增加,薄膜的石墨化程度下降;薄膜的硬度由3.7 GPa增加至5.3 GPa,磨损率从3.8×10-13 m3/(N·m)下降至7.9×10-14 m3/(N·m),摩擦系数从0.13上升至0.18。
Abstract
The CNx films are deposited on monocrystalline silicon by direct current glow discharge assisted pulsed laser deposition (PLD) technique under various laser fluxes. The composition, microstructure, surface morphology, mechanical and tribological properties of the films are characterized by scanning electron microscopy (SEM), Raman spectroscopy, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), nano indenter and ball-on-disk tribometer, respectively. The results show that the films are of amorphous structure. The nitrogen atomic content of the CNx film increases from 27.7% to 34.1% with the increase of laser flux from 5.1 J/cm2 to 7.5 J/cm2. An increased area percentage of sp3C—N bond, sp2C—N bond, and a decreased area percentage of sp3C—C bond are observed in the film. An increased degree of carbon sp3 hybrid and a decreased degree of graphitization of the film are found. With the increasing of laser flux, the film hardness increases from 3.7 GPa to 5.3 GPa, the wear rate of the film decreases from 3.8×10-13 m3/(N·m) to 7.9×10-14 m3/(N·m), and the friction coefficient increases from 0.13 to 0.18, respectively.
参考文献

[1] A Y Liu, M L Cohen. Prediction of new low compressibility solids[J]. Science, 1989, 245(4920):841-842.

[2] Y Aoi, K Ono, K Sakurada, et al.. Effects of heat treatment on structure of amorphous CNx thin films by pulsed laser deposition[J]. Thin Solid Films, 2001, 389(1-2): 62-67.

[3] Y H Cheng, Z H Sun, B K Tay, et al.. Influence of deposition pressure on the composition and structure of carbon nitride films deposited by direct current plasma assisted pulsed laser ablation[J]. Applied Surface Science, 2001, 182(1-2): 32-39.

[4] 郑晋翔, 郑晓华, 沈涛, 等. 递进式脉冲激光沉积CNx薄膜的组织结构与摩擦学特性[J]. 中国激光, 2012, 39(6): 0607001.

    Zheng Jinxiang, Zheng Xiaohua, Shen Tao, et al.. Microstructure and triobological behavior of CNx films deposited by iterative pulsed laser deposition[J]. Chinese J Lasers, 2012, 39(6): 0607001.

[5] E Cappellia, S Orlandob, D M Trucchia, et al.. Carbon nitride films by RF plasma assisted PLD: spectroscopic and electronic analysis[J]. Applied Surface Science, 2011, 257(12): 5175-5180.

[6] 郭建, 杨益民. 直流偏压对脉冲激光烧蚀沉积非晶碳膜的影响[J]. 光电子·激光, 2002, 13(10): 1044-1047.

    Guo Jian, Yang Yimin. Influence of DC biasing on amorphous carbon deposited by pulse laser ablation[J]. Journal of Optoelectronics·Laser, 2002, 13(10): 1044-1047.

[7] 肖兴成, 江伟辉, 田静芬, 等. 高温处理对CNx薄膜晶化的影响[J]. 物理学报, 2000, 49(1): 173-176.

    Xiao Xingcheng, Jiang Weihui, Tian Jingfen, et al.. Effect of high-temperature treatment on the crystallization of CNx thin films[J]. Acta Physica Sinica, 2000, 49(1): 173-176.

[8] X F Xu, N Xu, W Hu, et al.. Self-assembled growth of carbon nitride nanocones using abnormal glow discharge[J]. Applied Physics A-Materials Science and Processing, 2009, 96(2): 415-421.

[9] 张连珠. 氮直流辉光放电活性粒子(N+,N)的产生率[J]. 核聚变与等离子体物理, 2003, 23(2): 113-118.

    Zhang Lianzhu. Creation rates of active species (N+, N) in a nitrogen direct current glow discharge[J]. Nuclear Fusion and Plasma Physics, 2003, 23(2): 113-118.

[10] Y H Cheng, X L Qiao, J G Chen, et al.. Synthesis of carbon nitride films by direct current plasma assisted pulsed laser deposition[J]. Applied Physics A-Materials Science and Processing, 2002, 74(2): 225-231.

[11] K Kutasi, Z Donko, M Mohai, et al.. Formation of CNx layers in a nitrogen glow discharge with graphite electrodes[J]. Vacuum, 2002, 68(4): 311-319.

[12] M Aono, S Aizawa, N Kitazawa, et al.. XPS study of carbon nitride films deposited by hot filament chemical vapor deposition suing carbon filament[J]. Thin Solid Films, 2008, 516(5): 648-651.

[13] J T Titantah, D Lamoen. Carbon and nitrogen 1s energy levels in amorphous carbon nitride systems: XPS interpretation using first-principles[J]. Diamond and Relater Materials, 2007, 16(3): 581-588.

[14] Zheng Xiaohua, Tu Jiangping, Song Renguo. Microstructure and tribological behavior of pulsed laser deposited a-CNx films[J]. Applied Surface Science, 2010, 256(10): 3211-3215.

[15] Stephen Muhl, Juan Manuel Méndez. A review of the preparation of carbon nitride films[J]. Diamond and Related Materials, 1999, 8(10): 1809-1830.

[16] 罗乐, 张君芳, 方晓东, 等. 激光脉冲能量对类金刚石薄膜及其红外光学特性的影响[J]. 中国激光, 2010, 37(12): 3121-3126.

    Luo Le, Zhang Junfang, Fang Xiaodong, et al.. Influence of the laser pulsed energy upon the diamond-like carbon film and its infrared property[J]. Chinese J Lasers, 2010, 37(12): 3121-3126.

[17] Tan Manlin, Zhu Jiaqi, Han Jiecai, et al.. Raman characterization of boron doped tetrahedral amorphous carbon films[J]. Materials Research Bulletin, 2008, 43(2): 453-462.

[18] 白婷, 叶景峰, 刘晶儒, 等. 利用脉冲准分子激光在ZnS上沉积类金刚石薄膜[J]. 中国激光, 2007, 34(7): 992-997.

    Bai Ting, Ye Jingfeng, Liu Jingru, et al.. Pulsed excimer laser deposited diamond like carbon film on ZnS with wide-spectral transmission[J]. Chinese J Lasers, 2007, 34 (7): 992-997.

[19] 李俊杰, 曹培江, 郑伟涛, 等. 轰击离子能量对CNx薄膜中SP3型 C—N 键含量的影响[J]. 高等学校化学学报, 2003, 24(5): 880-883.

    Li Junjie, Cao Peijiang, Zheng Weitao, et al.. Influence of bombarding ions energy on the content of sp3C—N bonds in carbon nitride films[J]. Chemical Journal of Chinese Universities, 2003, 5(24): 880-883.

[20] 李铁军, 刘晶儒, 王丽戈. XeCl(308 nm)脉冲准分子激光沉积类金刚石薄膜[J]. 光学学报, 1997, 17(3): 331-337.

    Li Tiejun, Liu Jingru, Wang Lige. Pulsed laser deposition of diamond like carbon film with XeCl (308 nm) laser[J]. Acta Optica Sinica, 1997, 17(3): 331-337.

[21] 陈江博, 王丽, 苏雪琼, 等. 基片温度对脉冲激光沉积ZnO薄膜性质的影响[J]. 中国激光, 2009, 36(6): 1539-1544.

    Chen Jiangbo, Wang Li, Su Xueqiong, et al.. Affect of ZnO thin film of pulsed laser deposition by substrate temperatures[J]. Chinese J Lasers, 2009, 36(6): 1539-1544.

[22] 罗乐, 赵树弥, 仇冀宏, 等. 衬底温度对脉冲激光沉积类金刚石薄膜的影响[J]. 中国激光, 2010, 37(8): 2063-2067.

    Luo Le, Zhao Shumi, Qiu Jihong, et al.. Influence of the substrate temperature upon the diamond-like carbon films deposited by pulsed laser[J]. Chinese J Lasers, 2010, 37(8): 2063-2067.

[23] T Tokoroyama, M Goto, N Umehara, et al.. Effect of nitrogen atoms desorption on the friction of the CNx coating against Si3N4 ball in nitrogen gas[J]. Tribology Letters, 2006, 22(3): 215-220.

郑晓华, 宋建强, 杨芳儿, 陈占领. 辉光放电辅助脉冲激光沉积CNx薄膜的价键结构及机械性能[J]. 中国激光, 2013, 40(11): 1107002. Zheng Xiaohua, Song Jianqiang, Yang Fanger, Chen Zhanling. Valence Bond Structure and Mechanical Properties of CNx Films Prepared by Glow Discharge Assisted Pulsed Laser Deposition[J]. Chinese Journal of Lasers, 2013, 40(11): 1107002.

本文已被 1 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!