深紫外CMOS图像传感器测试匀光系统设计

匀光系统的均匀性是实现深紫外CMOS图像传感器参数测试的关键。根据傅里叶光学理论, 结合ArF准分子激光输出光斑特点, 设计了复眼阵列匀光系统的初始结构, 并在ZEMAX非序列模式下建立了匀光系统模型。针对ZEMAX光源中光线采样随机性的特点及匀光系统均匀性的要求, 对追迹光线数目及复眼阵列中透镜元个数进行了优化。在透镜元大小为1mm、采用1亿根光线并做30次平均后, 在12mm×12mm光斑范围内获得了均匀性为0.986的均匀照明光斑, 满足CMOS图像传感器测试对光斑均匀性优于0.97的要求。

Abstract

The uniformity of the uniform light system is the key for the parameter test of deep ultraviolet CMOS image sensors. Based on the Fourier optics theory and combining the characteristics of the ArF excimer laser output spot, the initial structure of the compound-eye array uniform light system was designed, and a uniform light system model was established in ZEMAX non-sequential mode. According to the characteristics of the randomness of the light sampling in the ZEMAX light source and the uniformity requirements of the uniform light system, the number of tracking rays and the number of lens elements in the compound eye array were optimized. By setting the lens element size of 1mm, applying 100million rays and being averaged for 30 times, a uniform illumination spot with a uniformity of 0.986 is obtained in the 12mm×12mm spot range, which is better than the requirement on the spot uniformity of 0.97 for CMOS image sensors.

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李琦, 齐月静, 卢增雄, 张清洋, 马敬, 杨光华, 苏佳妮. 深紫外CMOS图像传感器测试匀光系统设计[J]. 半导体光电, 2020, 41(3): 395. LI Qi, QI Yuejing, LU Zengxiong, ZHANG Qingyang, MA Jing, YANG Guanghua, SU Jiani. Design of Homogenizing Optical System for Testing CMOS Image Sensor in Deep Ultraviolet Region[J]. Semiconductor Optoelectronics, 2020, 41(3): 395.

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