[1] M. C. King, D. H. Berry. Photolithographic mask alignment using moiré techniques ［J］. J. Vacuum Sci. & Technol. B, 1972, 11(6): 2455～2458

[2] Y. Uchida, S. Hattori, T. Nomura. An automatic mask alignment technique using moiré interference［J］. J. Vacuum Sci. & Technol. B, 1987, 5(1): 244～247

[3] S. Zhou, Y. Yang, L. Zhao et al.. Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography［J］. Opt. Lett., 2010, 35(18): 3132～3134

[4] S. L. Zhou, Y. Q. Fu, X. P. Tang et al.. Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography［J］. Opt. Express, 2008, 16(11): 7869～7880

[5] M. C. King, D. H. Berry. Photolithographic mask alignment using moiré techniques［J］. Appl. Opt., 1972, 11(11): 2455～2457

[6] 周绍林, 杨勇, 陈旺富 等. 基于双光栅的纳米测量方法［J］. 光学学报, 2009, 29(3): 703～705

    Zhou Shaolin, Yang Yong, Chen Wangfu et al.. Dual-grating-based nanometer measurement［J］. Acta Optica Sinica, 2009, 29(3): 703～705

[7] N. Li, W. Wu, S. Y. Chou. Sub-20-nm alignment in nanoimprint lithography using moiré fringe ［J］. Nano Lett., 2006, 6(11): 2626～2629

[8] A. Moel, E. E. Moon, R. D. Frankel et al.. Novel on-axis interferometric alignment method with sub-10 wm precision［J］. J. Vacuum Sci. & Technol. B, 1993, 11(6): 2191～2194

[9] E. E. Moon, M. K. Mondol, P. N. Everett et al.. Dynamic alignment control for fluid-immersion lithographies using interferometric-spatial-phase imaging［J］. J. Vacuum Sci. & Technol. B, 2005, 23(6): 2607～2610

[10] 朱江平, 胡松, 于军胜 等. 基于叠栅条纹的光刻对准理论分析及标定方法［J］. 光学学报, 2012, 32(6): 0607001

    Zhu Jiangping, Hu Song, Yu Junsheng et al.. Theoretical analysis of photolithography alignment and calibration method based on moiré fringes［J］. Acta Optica Sinica, 2012, 32(6): 0607001