光子学报, 2019, 48 (4): 0416003, 网络出版: 2019-04-28  

氮气流量对磁控溅射制备类金刚石薄膜性能的影响

Effect of Nitrogen Gas Flow Rate on Properties of Diamond Like Carbon Films Prepared by Magnetron Sputtering
作者单位
南京航空航天大学 材料科学与技术学院, 江苏省能量转换材料与技术重点实验室, 南京 211100
引用该论文

王洪美, 李玉芳, 沈鸿烈, 翟子豪, 陈洁仪, 杨家乐, 杨艳. 氮气流量对磁控溅射制备类金刚石薄膜性能的影响[J]. 光子学报, 2019, 48(4): 0416003.

WANG Hong-mei, LI Yu-fang, SHEN Hong-lie, ZHAI Zi-hao, CHEN Jie-yi, YANG Jia-le, YANG Yan. Effect of Nitrogen Gas Flow Rate on Properties of Diamond Like Carbon Films Prepared by Magnetron Sputtering[J]. ACTA PHOTONICA SINICA, 2019, 48(4): 0416003.

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王洪美, 李玉芳, 沈鸿烈, 翟子豪, 陈洁仪, 杨家乐, 杨艳. 氮气流量对磁控溅射制备类金刚石薄膜性能的影响[J]. 光子学报, 2019, 48(4): 0416003. WANG Hong-mei, LI Yu-fang, SHEN Hong-lie, ZHAI Zi-hao, CHEN Jie-yi, YANG Jia-le, YANG Yan. Effect of Nitrogen Gas Flow Rate on Properties of Diamond Like Carbon Films Prepared by Magnetron Sputtering[J]. ACTA PHOTONICA SINICA, 2019, 48(4): 0416003.

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