光学 精密工程, 2016, 24 (3): 469, 网络出版: 2016-04-13   

掩模位置误差对光刻投影物镜畸变的影响

Effect of alignment errors of reticle on distortion in lithographic projection lens
杨旺 1,2,*黄玮 1尚红波 1
作者单位
1 中国科学院 长春光学精密机械与物理研究所, 吉林 长春 130033
2 中国科学院大学, 北京 100049
引用该论文

杨旺, 黄玮, 尚红波. 掩模位置误差对光刻投影物镜畸变的影响[J]. 光学 精密工程, 2016, 24(3): 469.

YANG Wang, HUANG Wei, SHANG Hong-bo. Effect of alignment errors of reticle on distortion in lithographic projection lens[J]. Optics and Precision Engineering, 2016, 24(3): 469.

参考文献

[1] International technology roadmap for semiconductors 2013 edition lithography [EB/OL]. http://www.itrs.net/ Links/2013ITRS/Litho2013.pdf.

[2] DE KLERK J. Performance of a high NA, dual stage 193 nm TWINSCANTM step & scan system for 80 nm applications[J]. SPIE, 2003, 5040: 822-840.

[3] THIBAULT S, PARENT J, ZHANG H, et al.. Developments in modern panoramic lenses: lens design, controlled distortion and characterization[J]. SPIE, 2011, 8197: 81970I.

[4] 陈杨, 王跃明. 大像场离轴三反望远镜畸变特性分析与设计[J]. 光学学报, 2013, 33(2): 0222003.

    CHEN Y, WANG Y M. Design and distortion characteristics analysis of the large-image-field off-axis three-mirror telescope[J]. Acta Optica Sinica, 2013, 33(2): 0222003. (in Chinese)

[5] 巩盾, 王红. 含有自由曲面的大视场低畸变同轴三反射光学系统设计[J]. 光学学报, 2014, 34(7): 0722001.

    GONG D, WANG H. Optical design of large field and low distortion coaxial three mirror system with free-form surface[J]. Acta Optica Sinica, 2014, 34(7): 0722001. (in Chinese)

[6] 周子卿, 赵鹏, 李勃, 等. 基于共线向量的非量测镜头畸变校正[J]. 光学学报, 2014, 34(10): 1015001. (in Chinese)

    ZHOU Z Q, ZHAO P, LI B, et al.. Nonmetric lens distortion calibration based on collinear vectors[J]. Acta Optica Sinica, 2014, 34(10): 1015001.

[7] 徐嵩, 徐秀霞, 刘树光, 等. 摄像机畸变标定的模型参考逼近方法[J]. 光学学报, 2014, 34(10): 0715001.

    XU S, SUN X X, LIU S G, et al.. Model reference approaching method of camera distortion calibration[J]. Acta Optica Sinica, 2014, 34(10): 0715001. (in Chinese)

[8] BASS M. Handbook of Optic (Vol. 1) [M]. McGraw-Hill, Inc, 1995: 80-100.

[9] 张蔚, 李恩普, 陈建明. 大视场光学系统畸变曲线拟合[J]. 电光与控制, 2004, 11(4): 57-62.

    ZHANG W, LI E P, CHEN J M. Curved-fitting methods for distortion correction of large-FOV optical system[J]. Electronics Optics & Control, 2004, 11(4): 57-62. (in Chinese)

[10] BRAAT J, RENNSPIES P. Effect of lens distortion in optical step-and-scan lithography[J]. Applied Optics, 1996, 35(4): 690-700.

[11] RICOLFE-VIALA C, SANCHEZ-SALMERON A–J. Lens distortion models evaluation[J]. Applied Optics, 2010, 49(30): 5914-5928.

[12] TURNER K T, VEERARAGHAVAN S, SINHA J K. Predicting distortions and overlay errors due to wafer deformation during chucking on lithography scanners[J]. Micro/Nanolith. MEMS MOEMS, 2009, 8(4): 043015.

[13] SHANNON R R. The Art and Science of Optical Design[M]. Cambridge University Press, 1997: 24-58.

[14] STEGUN A, M. Handbook of Mathematical Functions with Formulas, Graphs, and Mathematical Tables[M]. New York: Dover, 1972: 771-802.

[15] OMURA Y. Projection exposure method and apparatus and projection optical system: European Patent 1139138[P].

杨旺, 黄玮, 尚红波. 掩模位置误差对光刻投影物镜畸变的影响[J]. 光学 精密工程, 2016, 24(3): 469. YANG Wang, HUANG Wei, SHANG Hong-bo. Effect of alignment errors of reticle on distortion in lithographic projection lens[J]. Optics and Precision Engineering, 2016, 24(3): 469.

本文已被 1 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!