斜入射微结构高度误差的优化设计

基于衍射效率与入射角度的表达式和正入射时微结构高度误差与衍射效率的表达式，建立了斜入射时衍射光学元件(DOEs)的微结构高度误差与衍射效率和带宽积分平均衍射效率(PIDE)的数学关系。当相对微结构高度误差的绝对值相等时，负相对微结构高度误差高于正相对微结构高度误差对应的衍射效率和带宽积分平均衍射效率。该分析方法和结论为衍射光学元件的微结构高度加工公差的制定提供了理论参考。

Abstract

Based on the expression between diffraction efficiency and incident angle and the expression between diffraction efficiency and micro-structure height error under normal incidence, the mathematical relationship between micro-structure height error and diffraction efficiency or polychromatic integral diffraction efficiency (PIDE) for diffractive optical elements (DOEs) under oblique incidence is established. When the absolute value of the relative micro-structure height errors is equal, the corresponding diffraction efficiency and PIDE with negative micro-structure height errors are higher than those with positive micro-structure height errors. The analysis method and conclusion provide a theoretical reference for the determination of the machining tolerance of micro-structure height error for DOEs.

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杨亮亮, 刘成林, 张志海, 唐健. 斜入射微结构高度误差的优化设计[J]. 激光与光电子学进展, 2017, 54(6): 060501. Yang Liangliang, Liu Chenglin, Zhang Zhihai, Tang Jian. Optimal Design of Depth-Scaling Error with Oblique Incidence[J]. Laser & Optoelectronics Progress, 2017, 54(6): 060501.

斜入射微结构高度误差的优化设计

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