中国激光, 2015, 42 (3): 0303012, 网络出版: 2015-02-03   

光波导端面的准分子激光刻蚀技术研究 下载: 564次

Research on Excimer Laser Etching Technology for Achieving Optical Waveguide End Face
贾娜娜 1,2,*邓传鲁 1,2庞拂飞 1,2顾鑫 1,2王廷云 1,2
作者单位
1 上海大学特种光纤与光接入网省部共建重点实验室, 上海 200072
2 上海大学通信与信息工程学院, 上海 200072
引用该论文

贾娜娜, 邓传鲁, 庞拂飞, 顾鑫, 王廷云. 光波导端面的准分子激光刻蚀技术研究[J]. 中国激光, 2015, 42(3): 0303012.

Jia Nana, Deng Chuanlu, Pang Fufei, Gu Xin, Wang Tingyun. Research on Excimer Laser Etching Technology for Achieving Optical Waveguide End Face[J]. Chinese Journal of Lasers, 2015, 42(3): 0303012.

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贾娜娜, 邓传鲁, 庞拂飞, 顾鑫, 王廷云. 光波导端面的准分子激光刻蚀技术研究[J]. 中国激光, 2015, 42(3): 0303012. Jia Nana, Deng Chuanlu, Pang Fufei, Gu Xin, Wang Tingyun. Research on Excimer Laser Etching Technology for Achieving Optical Waveguide End Face[J]. Chinese Journal of Lasers, 2015, 42(3): 0303012.

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