强激光与粒子束, 2010, 22 (9): 2181, 网络出版: 2010-09-21   

低亚表面损伤石英光学基底的加工和检测技术

Fabrication and detection technique of fused silica substrate with extremely low subsurface damage
马彬 1,2,3,*沈正祥 1,2,3张众 1,2,3贺鹏飞 1,2,3季一勤 1,2,3刘华松 1,2,3刘丹丹 1,2,3王占山 1,2,3
作者单位
1 同济大学 精密光学工程技术研究所, 上海 200092
2 同济大学 航空航天与力学学院, 上海 200092
3 天津津航技术物理研究所 天津市薄膜光学重点实验室, 天津 300192
引用该论文

马彬, 沈正祥, 张众, 贺鹏飞, 季一勤, 刘华松, 刘丹丹, 王占山. 低亚表面损伤石英光学基底的加工和检测技术[J]. 强激光与粒子束, 2010, 22(9): 2181.

Ma Bin, Shen Zhengxiang, Zhang Zhong, He Pengfei, Ji Yiqin, Liu Huasong, Liu Dandan, Wang Zhanshan. Fabrication and detection technique of fused silica substrate with extremely low subsurface damage[J]. High Power Laser and Particle Beams, 2010, 22(9): 2181.

参考文献

[1] Cmapbell J H,Hwaley-Fedder R A. NIF optical materials and fabrication technologies: An overview[C]//Proc of SPIE.2004,5341: 84-101.

[2] Feit M D, Rubenchik A M. Influence of subsurface cracks on laser induced surface damage[C]//Proc of SPIE.2004,5273:264-272.

[3] Wong J, Ferriera J L, Lindsey E F, et al. Morphology and microstructure in fused silica induced by high fluence ultraviolet 3ω (355 nm) laser pulses[J].Journal of Non-Crystalline Solids,2006,352:255-272.

[4] Salleo A, Genin F, Yoshiyama J. Laser-induced damage of fused silica initiated at scratches[C]//Proc of SPIE.1997,3047:987-999.

[5] Neauport J, Cormont P, Legros P, et al. Imaging subsurface damage of grinded fused silica optics by confocal fluorescence microscopy[J].Optics Express,2009,17(15): 3543-3554.

[6] Fine K R, Garbe R, Gip T, et al. Non-destructive real-time direct measurement of subsurface damage[C]//Proc of SPIE.2005,5799:105-110.

[7] 陈宁, 张清华, 许乔, 等. K9基片的亚表面损伤探测及化学腐蚀处理技术研究[J]. 强激光与粒子束, 2005,17(9):1289-1293. (Chen Ning, Zhang Qinghua, Xu Qiao, et al. Studies on subsurface damage detection and wet-etching process of K9 optics.High Power Laser and Particle Beams,2005,17(9):1289-1293)

[8] 徐世珍, 吕海兵, 田东斌, 等. 酸蚀深度对熔石英三倍频激光损伤阈值的影响[J]. 强激光与粒子束, 2008,20(5):760-764.(Xu Shizhen, Lü Haibing, Tian Dongbin, et al. Effects of acid etching depth on 355 nm laser induced damage threshold of fused silica.High Power Laser and Particle Beams,2008,20(5):760-764)

[9] 项震, 聂传继, 葛剑虹, 等. 光学元件亚表面缺陷结构的蚀刻消除[J]. 强激光与粒子束, 2007,19(3):373-376.(Xiang Zhen, Nie Chuangji, Ge Jianhong, et al. Eliminating of subsurface damage structure.High Power Laser and Particle Beams,2007,19(3): 373-376)

马彬, 沈正祥, 张众, 贺鹏飞, 季一勤, 刘华松, 刘丹丹, 王占山. 低亚表面损伤石英光学基底的加工和检测技术[J]. 强激光与粒子束, 2010, 22(9): 2181. Ma Bin, Shen Zhengxiang, Zhang Zhong, He Pengfei, Ji Yiqin, Liu Huasong, Liu Dandan, Wang Zhanshan. Fabrication and detection technique of fused silica substrate with extremely low subsurface damage[J]. High Power Laser and Particle Beams, 2010, 22(9): 2181.

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