[1] Liu Huasong, Wang Lishuan, Jiang Yugang, et al. Adjustments of refractive index and stress of SiO2 films prepared by IBS technology[J]. Optics and Precision Engineering, 2013, 21(9): 2238-2243. (in Chinese)

[2] Zhang Jinsheng, Zhang Jinlong, Ning Yongqiang, et al. Design and optimization of 1 555 nm broad-bandpass filter film[J]. Chinese Optics, 2013, 21(9): 557-562. (in Chinese)

[3] Ma Hongping, Cheng Xinbin, Zhang Jinlong, et al. Damage growth characteristics of artificial nodules prepared by different processes [J]. Infrared and Laser Engineering, 2017, 46(5): 0521001. (in Chinese)

[4] Lu J Y, Zhao Q N, Hou S H, et al. Study on antireflection of TiO2-SiO2/SiO2 double-layer films prepared by sol-gel method[J]. Adv Mater Res, 2012, 591-593:1012-1016.

[5] Cai Xikun, Zhang Lichao, Shi Guang, et al. Low stress DUV optical coatings deposited by ion beam sputtering [J]. Chinese Optics, 2016, 9(6): 649-655. (in Chinese)

[6] Liu Huasong, Jiang Chenghui, Wang Lishuan, et al. Effects of annealing on properties of Ta2O5 thin films deposited by ion beam sputtering[J]. Optics and Precision Engineering, 2014, 22(11): 2645-2651. (in Chinese)

[7] Jiang Yugang, Wang Lishuan, Liu Huasong, et al. Analysis on effects of thermal treatment on refractive index and absorption properties of SiO2 film[J]. Infrared and Laser Engineering, 2014, 43(4): 3334-3337. (in Chinese)

[8] Ji Yiqin, Jiang Yugang, Liu Huasong, et al. Analysis on effects of thermal treatment on structural characteristic of ion beam sputtering SiO2 films[J]. Infrared and Laser Engineering, 2013, 42(2): 418-422. (in Chinese)

[9] Zhou B, Prorok B C. A new paradigm in thin film indentation [J]. J Mater Res, 2010, 25: 1671-1678.

[10] Klemberg-Sapieha J E, Oberste-Berghaus J, Martinu L, et al. Mechanical characteristics of optical coatings prepared by various techniques: a comparative study [J]. Appl Opt, 2004, 43: 2670-2679.

[11] Thielsch R, Gatto A, Kaiser N. Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep ultraviolet spectral region[J]. Appl Opt, 2002, 41: 3211-3217.